Study on Precursor Distribution of a No-inner-wall Deposition Atmospheric Pressure Plasma Jet Used for Thin Film Deposition

Abstract

An atmospheric pressure jet that effectively prevents inner wall deposition has been developed, and its precursor distribution and thin-lm deposition characteristics have been studied. Through ow eld simulation and particle tracing methods, it has been demonstrated that, under the protection of highvelocity discharge gas, the reactants will not diffuse to the inner wall of the plasma jet device, effectively preventing wall deposition. The pattern of the deposited lm closely resembles the diffusion pattern of the precursor within the plasma jet apparatus. By investigating deposited lms in different regions, the in uence of precursor distribution on lm morphology and composition has been studied. This plasma device offers a stable plasma plume for thin lm deposition and nanoparticle preparation.