2020
DOI: 10.1007/s00170-019-04860-2
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Study on process parameters of fabrication fine diameter electroplated diamond wire for slicing crystalline silicon solar cell

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Cited by 21 publications
(4 citation statements)
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“…The step of nickel pre-plating was performed in a solution containing 220 g/L nickel chloride hexahydrate (NiCl 2 ·6H 2 O; Aladdin, AR) and 100 mL/L hydrochloric acid (HCl; Chuandong, AR) at a current density of 5 A/dm 2 for 4 min. The nickel-plating step was performed in a solution containing 380 g/L nickel sulfamate (H 4 N 2 NiO 6 S 2 ·4H 2 O; Macklin, 99%), 32.5 g/L nickel chloride hexahydrate (NiCl 2 ·6H 2 O; Aladdin, AR), and 32.5 g/L boric acid (H 3 BO 3 ; Sinopharm, AR) [ 21 ] at a current density of 1 A/dm 2 for 1, 5, 10, 15, and 20 min, respectively. The water used in the experiments was up to the standard of I level.…”
Section: Methodsmentioning
confidence: 99%
“…The step of nickel pre-plating was performed in a solution containing 220 g/L nickel chloride hexahydrate (NiCl 2 ·6H 2 O; Aladdin, AR) and 100 mL/L hydrochloric acid (HCl; Chuandong, AR) at a current density of 5 A/dm 2 for 4 min. The nickel-plating step was performed in a solution containing 380 g/L nickel sulfamate (H 4 N 2 NiO 6 S 2 ·4H 2 O; Macklin, 99%), 32.5 g/L nickel chloride hexahydrate (NiCl 2 ·6H 2 O; Aladdin, AR), and 32.5 g/L boric acid (H 3 BO 3 ; Sinopharm, AR) [ 21 ] at a current density of 1 A/dm 2 for 1, 5, 10, 15, and 20 min, respectively. The water used in the experiments was up to the standard of I level.…”
Section: Methodsmentioning
confidence: 99%
“…Renowned for its high degree of hardness, brittleness, and excellent chemical stability at room temperature, silicon is a crucial semiconductor material. The techniques of processing silicon include acid etching and wire cutting [ 12 , 13 ]. Acid etching is the chemical etching of silicon materials [ 14 ], such as using HNO 3 -HF for isotropic etching [ 15 ], employing KOH or NaOH for anisotropic etching [ 16 ], and utilizing plasma-etching techniques.…”
Section: Introductionmentioning
confidence: 99%
“…With the rapid development of the photovoltaic and semiconductor industries, the existing sawing efficiency does not meet the production needs of enterprises; to improve the sawing speed and efficiency of the material, it is necessary to improve its alignment speed, so that it will be able to withstand high speeds [4,5]. Increasing the alignment speed can reduce the sawing time, material consumption, production costs, etc., but with the increasing speed of the alignment the operational stability requirements are also increasingly high [6,7].…”
Section: Introductionmentioning
confidence: 99%