Study on radial uniformity of large aperture capacitively coupled plasma

Wang, Xiang; Fan, Bin; Jiao, Peiqi; Xin, Qiang; Zeng, Liang

doi:10.1117/12.2653311

Cited by 1 publication

(1 citation statement)

References 6 publications

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“…The radius r of the bottom electrode is 325 mm, and it is connected to a matcher, which is connected to radio frequency (RF) power (13.56 MHz, 500 W). More information about the size of the discharge chamber, such as the electrode gap h , the radius R of the discharge chamber, etc., was provided in the literature [ 25 ]. The top electrode and the side walls are grounded.…”

Section: Methodsmentioning

confidence: 99%

The Tailored Material Removal Distribution on Polyimide Membrane Can Be Obtained by Introducing Additional Electrodes

et al. 2023

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Reactive ion etching (RIE) is a promising material removal method for processing membrane diffractive optical elements and fabrication of meter-scale aperture optical substrates because of its high-efficiency parallel processing and low surface damage. However, the non-uniformity of the etching rate in the existing RIE technology will obviously reduce the machining accuracy of diffractive elements, deteriorate the diffraction efficiency and weaken the surface convergence rate of optical substrates. In the etching process of the polyimide (PI) membrane, additional electrodes were introduced for the first time to achieve the modulation of the plasma sheath properties on the same spatial surface, thus changing the etch rate distribution. Using the additional electrode, a periodic profile structure similar to the additional electrode was successfully processed on the surface of a 200-mm diameter PI membrane substrate by a single etching iteration. By combining etching experiments with plasma discharge simulations, it is demonstrated that additional electrodes can affect the material removal distribution, and the reasons for this are analyzed and discussed. This work demonstrates the feasibility of etching rate distribution modulation based on additional electrodes, and lays a foundation for realizing tailored material removal distribution and improving etching uniformity in the future.

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Section: Methodsmentioning

confidence: 99%