Study on resist sensitivities for nano-scale imaging using water window X-ray microscopy

Gowa, Tomoko; Takahashi, Tomohiro; Oshima, Akira; Tagawa, Seiichi; Washio, Masakazu

doi:10.1016/j.radphyschem.2010.07.041

Cited by 5 publications

(4 citation statements)

References 15 publications

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“…In this spectral region, water-containing intracellular compartments absorb much less than carbon-rich structures (e.g., plasma membranes and organelles), which absorb photons efficiently, leading to high contrast images. As previously reported, in the "water window", intact biological specimens up to 10 µm thick can be observed [10,11].…”

Section: Introductionsupporting

confidence: 66%

Imaging of Cell Structures Using Optimized Soft X-ray Contact Microscopy

et al. 2020

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This work is to study the relationship between the exposure conditions and the quality of cell imaging with soft X-ray contact microscopy (SXCM). It is a crucial step in the efficient visualization of cell structures. Three different human cell lines: DU145 prostate carcinoma cells, HCC38 breast cancer cells, and Poietics mesenchymal stem cells were used to establish the optimal exposure conditions in SXCM. The image quality depended on the soft X-ray (SXR) absorbed energy and photoresist development conditions. At lower SXR energy (200 or 400 SXR pulses), sharp cell edges, membrane projections, and cell–cell connections were visible. In contrast, higher energy (600 or 800 SXR pulses) allowed observation of the cytoskeleton and the nucleus in a cell type-dependent manner (the influence of cell thickness and internal complexity was noted).

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Section: Introductionsupporting

confidence: 66%

Imaging of Cell Structures Using Optimized Soft X-ray Contact Microscopy

et al. 2020

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“…They consist of copolymers of -chloromethacrylate and -methylstyrene with different molecular weights, and undergo main-chain scission upon EB irradiation (positive-tone). 1,2) In our previous studies, ZEP resists have exhibited high sensitivities for not only EB, but also Xrays 3) and heavy ion beams. 4) Meanwhile, interesting results have been obtained for high dose irradiation (>10 mC cm À2 ) of 30 kV EB lithography (ZEISS NVision 40 with NPVE system) suggesting that ZEP resists become insoluble in supplier-recommended developers after irradiation (Fig.…”

mentioning

confidence: 94%

Study on Positive–Negative Inversion of Chlorinated Resist Materials

Oyama

Oshima

Yamamoto

et al. 2011

Appl. Phys. Express

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The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive–negative inversion induced by EB were attempted to be clarified with ultraviolet–visible (UV–vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5 mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

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“…To achieve high resolution in the recorded image, we should also switch the recording device from x-ray CCD cameras to sensitive EUV resists to overcome the resolution limitation of the CCD pixel size, coupled with Schwarzschild optics, consisting of Sc/Cr MLMs with a reflection coefficient of the order of 15% around 3.2 nm [11]. Although our proposal is based on a simple microscope construction, the key component is the UTA emitted at 3.2 nm from a hot dense Bi plasma point source, combined with Sc/Cr MLMs and sensitive EUV resists based on photochemical reaction [16,17].…”

Section: Proposal Of the Uta Source Microscope For Single Shot Photogmentioning

confidence: 99%