Study on Ronchi Shearing Interferometry for Wave-Front Aberration Measurement of Lithography Projection Lens

Feibin, 吴飞斌 Wu; Feng, 唐锋 Tang; Xiangzhao, 王向朝 Wang; Jie, 李杰 Li; Sikun, 李思坤 Li

doi:10.3788/cjl201542.0308008

Cited by 8 publications

(2 citation statements)

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“…To realize high-precision wavefront aberration measurement by Ronchi LSI, eliminating the impact of high diffraction orders in ROI is the prerequisite, which is mainly achieved by increasing the number of phase-shifting steps. Therefore, researchers proposed 8-frame, 10-frame, 13-frame, and (3N+1)-frame methods [6][7][8] to eliminate the effects of the first ±5, ±9, ±15, and all multi-diffraction orders, respectively. Among the existing methods, the 8-frame, 10-frame, and 13-frame methods cannot fully eliminate the errors of all diffraction orders, resulting in relatively large peak-to-valley (PV) and root-mean-square (RMS) values of the error wavefront at small shear rates.…”

Section: Introductionmentioning

confidence: 99%

Wavefront reconstruction for double-grating Ronchi lateral shearing interferometry with nonlinear optimization

Shi,

Liu,

Shao

et al. 2023

Optical Design and Testing XIII

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Section: Introductionmentioning

confidence: 99%

Wavefront reconstruction for double-grating Ronchi lateral shearing interferometry with nonlinear optimization

Shi,

Liu,

Shao

et al. 2023

Optical Design and Testing XIII

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“…It offers the advantages of a shared optical path, eliminating the necessity for reference waves, and features a straightforward structure. This technology holds significant promise for enhancing wavefront measurement precision [6][7][8] .…”

Section: Introductionmentioning

confidence: 99%

Research on lateral-shear interferometry based on double checkerboard grating

Bai,

Liu,

2023

Optical Design and Testing XIII

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The grating lateral-shear interferometry has a wide range of applications in wavefront sensing. The lateral-shear interferometer based on Ronchi grating can be applied for high-precision wavefront aberration detection of lithography projection lenses, which is one of the critical issues to overcome lithography challenges. The conventional Ronchi shearing interferometer object grating consists of two sets of one-dimensional Ronchi grating lines perpendicular to each other in order to obtain wavefront information in two directions, namely X and Y. During the experiment, one set is moved into the optical path for phase shifting and measurement, then the other set of grating lines is repeatedly operated. To reduce the complexity of experimental operations, this paper proposes a lateral-shear interference system based on double checkerboard gratings. The object grating and image grating are both set as checkerboard grating, and the rotation angle of the checkerboard grating varies according to the optical system's shear rate, allowing each phase shift to obtain wavefront information in X and Y directions. Multiple uniform phase shifts are performed to extract ± 1 order diffraction wavefronts of X and Y directions. The shear wavefront of the optical system to be measured is calculated from the fourwave interference light field, then the original wavefront can be restored by differential Zernike. Through theoretical analysis and simulation, this double checkerboard system can achieve wave aberration measurement with the same accuracy as traditional Ronchi interferometers, improving the real-time performance of projection lenses wave aberration measurement, and providing more possibilities for subsequent structural improvements of Ronchi lateral-shear interferometer.

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Improved Ronchi lateral-shearing interferometry based on sinusoidal amplitude grating

Liu,

Zhu,

Shi

et al. 2024

Optical Design and Testing XIV

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Study on Ronchi Shearing Interferometry for Wave-Front Aberration Measurement of Lithography Projection Lens

Cited by 8 publications

References 0 publications

Wavefront reconstruction for double-grating Ronchi lateral shearing interferometry with nonlinear optimization

Wavefront reconstruction for double-grating Ronchi lateral shearing interferometry with nonlinear optimization

Research on lateral-shear interferometry based on double checkerboard grating

Improved Ronchi lateral-shearing interferometry based on sinusoidal amplitude grating

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