1998
DOI: 10.1016/s0169-4332(97)00379-6
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Study on the crystallization process of Ni P amorphous alloy

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Cited by 62 publications
(37 citation statements)
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“…There are no significant compositional changes during crystallization. [21] The P content of the electroless Ni layer used in this work was measured to be about 12 at% in the very fine grain region near the Cu substrate. Figure 7 is a cross-sectional TEM micrograph of the interface between the eutectic Au-Sn solder and the electroless Ni in the assolidified bump.…”
Section: B Detailed Interface Microstructurementioning
confidence: 86%
See 1 more Smart Citation
“…There are no significant compositional changes during crystallization. [21] The P content of the electroless Ni layer used in this work was measured to be about 12 at% in the very fine grain region near the Cu substrate. Figure 7 is a cross-sectional TEM micrograph of the interface between the eutectic Au-Sn solder and the electroless Ni in the assolidified bump.…”
Section: B Detailed Interface Microstructurementioning
confidence: 86%
“…[20][21] In general, as-plated electroless Ni(Ni-P) layer is amorphous at high P contents (P greater than about 10 at.%) and tends to crystallize on annealing. There are no significant compositional changes during crystallization.…”
Section: B Detailed Interface Microstructurementioning
confidence: 99%
“…The curves revealed a progressive increase of corrosion potential accompanied by thedecrease of anodic current density, indicating the improvement of corrosion resistance with increasing annealing temperature. It is evident from previous research works that nickel based alloy coatings have preferential dissolution of nickel which occurs at opencircuit potential, leading to the enrichment of phosphorus on the surface layer [8][9][10]. Then the enriched phosphorus surface reacts with water to form a layer of adsorbed hypophosphite anions (H 2 PO 2-).…”
Section: Coating Surface Morphologies and Elemental Compositionmentioning
confidence: 99%
“…At higher temperature (approximately 370 °C), the heat treatment caused precipitation of Ni 3 P phase along with its metastable forms, which eventually enhances the adhesion bonding between the coatings and the substrate [6], this aspect to the best knowledge of the authors has received very little or no attention from researchers so far. The purpose of the duplex Ni-W-P layer on Ni-P coating can be explained by the fact that Ni-W-P has better properties in terms of corrosion and wear than Ni-P which in turns, has better adhesion/contact with the mild steel substrate, so that it acts as better intermediate layer [7][8][9]. The improved corrosion resistance of this coating is due largely to the huge amount of grain boundary diffusion paths provided by the nanostructure of the Ni 3 P and crystalline Ni at high temperature, caused by the furnace annealing especially if air cooled, which favored the formation of the dense nickel-tungsten and nickel oxide films on the surface [10][11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…[85] It has been found that the P content and the thermal history determine the structure and properties of the electroless Ni layer. [108][109][110][111][112][113][114][115] In general, as-plated electroless Ni(Ni-P) layer is amorphous at high P contents (P greater than about 10 at.%) and tends to undergo self (or thermal)-crystallization on annealing. There are no significant compositional changes during crystallization.…”
Section: Detailed Interface Microstructure Of Solder Bumpmentioning
confidence: 99%