SU-8 based deep x-ray lithography/LIGA

Jian, L. K.; Desta, Yohannes M.; Goettert, Jost; Bednarzik, Martin; Loechel, B.; Jin, Yoonyoung; Aigeldinger, Georg; Singh, Varshni; Ahrens, Gisela; Gruetzner, G.; Ruhmann, Ralf; Degen, Reinhard

doi:10.1117/12.478246

Cited by 22 publications

(11 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Use of SU-8 photoresist for very high aspect ratio X-ray lithography was first investigated by Bogdanov in 1998 (Bogdanov andPeredkov 2000). Since then, it has been proved that the resolution and quality of SU-8 using Xray lithography is as good as PMMA (Jian et al 2003) and its sensitivity is 70 times greater (Singleton et al 2001).…”

Section: Introductionmentioning

confidence: 98%

Fabrication of support structures to prevent SU-8 stiction in high aspect ratio structures

et al. 2006

View full text Add to dashboard Cite

We have previously demonstrated that it is possible to fabricate densely-packed high aspect ratio structures in SU-8 by means of a top-plate support member which stiffens the overall structure and prevents pattern collapse. In this work we have computed the tensile stresses induced in the top-plate structures due to the capillary forces that arise between the columns due to the surface tension of the drying liquid. We have further studied the dynamic behavior of the structure after an instantaneous force. Based on these results, we have shown that the predicted optimal thickness of the top-plate structure is sufficient to maintain structural integrity.

show abstract

Section: Introductionmentioning

confidence: 98%

Fabrication of support structures to prevent SU-8 stiction in high aspect ratio structures

et al. 2006

View full text Add to dashboard Cite

show abstract

“…The use of SU-8 or similar photoresists for deep X-ray lithography (DXRL) represents an essential step by which this technology becomes competitive also from an economic point of view (Jian et al 2003). The discussion and results of this work refer to the production of micromechanical gear wheels for transmissions produced with a direct LIGA technology, e.g.…”

Section: Introductionmentioning

confidence: 99%

Investigations on possibilities of inline inspection of high aspect ratio microstructures

et al. 2006

Self Cite

View full text Add to dashboard Cite

LIGA is the basic idea of promising developments for the manufacturing of microelectromechanical system parts containing high aspect ratio microstructures. Aim of the work is a brief discussion of the starting-points for inline process inspection within a direct LIGA technology using deep X-ray lithography for the production of micromechanical gear wheels with critical dimensions of similar to 35 mu m width at similar to 1 mm height as well as to show methodic and technical measuring possibilities. Firstly, results of the determination of residual solvent content distribution within ultra-thick SU-8 films are shown obtained from refracted near field optical measurements. Furthermore, the capability of X-ray computer tomographic imaging is discussed and measurements for the determination of the three-dimensional shape of high aspect ratio microstructures are practically demonstrated with microscopic and interferometric optical methods. Finally, first results demonstrate the potential of the optical coherence tomography for several further important measurement tasks, among others, e.g. for the imaging of the distribution of mechanical stress at the resist-substrate interface. The results show that much information which is essential in the LIGA process can be achieved with recently available measurement methods. However, further development of non-destructive measurement techniques would be desirable for an effective inline process control of mass production of micromechanical parts

show abstract

“…Besides simple, cylindrical structures efforts are focusing on fabricating more complex structures including multi-level (Jian et al 2003) and ''quasi 3D'' patterns as well as taller (Turner et al 2003) (millimeter and higher) and smaller (Wang et al 2003) (sub-micrometer) HARM structures, and also on special materials for selected applications (Wiche2003).…”

Section: Introductionmentioning

confidence: 99%

Direct LIGA service for prototyping: status report

Loechel¹,

Goettert

Desta

2006

Microsyst Technol

View full text Add to dashboard Cite

Since the early 1990s a variety of applications ranging from precision metallic, ceramic, or polymeric parts to complex devices for micro-fluidic and microoptic applications have been discussed with the assumption that LIGA can either make a significant contribution or is the sole technology able to make these products. The question today is, have individual LIGA groups or even the entire LIGA community achieved this goal? Despite major investments, a lot of hard work from many students and researchers, and some promising ''prototypes'', a true mass product made by direct LIGA, i.e., using X-ray lithography and electroplating, has still not entered the market. This paper will briefly present the current status of direct-LIGA technology and discuss some examples of commercialization efforts as well as prospects for high-volume production.

show abstract

SU-8 based deep x-ray lithography/LIGA

Cited by 22 publications

References 0 publications

Fabrication of support structures to prevent SU-8 stiction in high aspect ratio structures

Fabrication of support structures to prevent SU-8 stiction in high aspect ratio structures

Investigations on possibilities of inline inspection of high aspect ratio microstructures

Direct LIGA service for prototyping: status report

Contact Info

Product

Resources

About