SU-8 nano-nozzle fabrication for electrohydrodynamic jet printing using UV photolithography

Wang, Jili; Yin, Zhifu

doi:10.1016/j.mssp.2018.05.028

Cited by 15 publications

(5 citation statements)

References 36 publications

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“…The 1 H NMR and 13 C NMR spectra of PI-1 and TXSRs are presented comparatively in Figures S1 and S2. Comparing the 1 H NMR and 13 C NMR spectra of TXSR-1 with PI-1, the peaks at 3.81 and 1.21 ppm in 1 H NMR spectra and the peaks located at 58.47 and 18.35 ppm in 13 C NMR spectra for −SiOCH 2 CH 3 groups in PI-1 disappeared, which could illustrate that −SiOCH 2 CH 3 has been hydrolyzed completely. Moreover, 29 Si NMR spectra of TXSRs (Figure S3) revealed that the peaks at approximately −65.00 and 10.00 ppm could be ascribed to T (SiO 3/2 ) and M (SiO 1/2 ) compositions in their molecular structures, respectively.…”

Section: ■ Results and Discussionmentioning

confidence: 97%

“…In recent years, photolithography technology has received growing attention due to its intriguing industrial applications in printing, microelectronic devices, semiconductor materials, integrated circuits, and packaging. − A photoresist is composed of resin, a photosensitizer, solvent, and an additive. The main parameters of photoresists are photosensitivity, resolution, thermal stability, and adhesion to the substrate .…”

Section: Introductionmentioning

confidence: 99%

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A Realizable Green Strategy to Negative Polyurethane Photoresists through the Application of a Silicone Resin Photoinitiator

Liao

et al. 2020

ACS Appl. Polym. Mater.

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In order to realize the recycling of negative photoresist materials, four thioxanthone silicone resin photoinitiators (TXSRs) were prepared and used in the preparation of a polyurethane acrylate (PUA) negative photoresist. Their structures were confirmed by 1 H NMR, 13 C NMR, 29 Si NMR, FTIR, and GPC. The photopolymerization kinetics of acrylate monomers initiated by the TXSRs demonstrated their comparative initiating activities to the commercial CQ (camphorquinone)/MDEA (N-methyldiethanolamine) composite. TXSRs are also revealed as a polymer modifier by evidence of the improved properties for the cured films such as better thermal stability, lower surface tension, and enhanced resistance against solvent. Due to their high initiating efficiency and better ethanol resistance of the cured PUA films, a trial pattern experiment of PUA with TXSR-2 as a photoinitiator developed in ethanol was successfully carried out. More importantly, the PUA negative photoresist without light exposure could be recovered and used next time.

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Section: ■ Results and Discussionmentioning

confidence: 97%

Section: Introductionmentioning

confidence: 99%

A Realizable Green Strategy to Negative Polyurethane Photoresists through the Application of a Silicone Resin Photoinitiator

Liao

et al. 2020

ACS Appl. Polym. Mater.

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“…Unfortunately, despite the concise of these methods, the nozzle inner diameter is merely on the micro-scale. An SU-8 nano nozzle has also been fabricated, with the nozzle channel being a nanoscale crack thermally induced by volume shrinkage; however, the size and reproducibility of the cracks are hard to control.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of a Polymer Nano Nozzle for Electrohydrodynamic Small-Molecule Solvent Inkjet Printing

et al. 2023

ACS Appl. Nano Mater.

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Electrohydrodynamic jet (E-jet) printing promises to become a highly efficient and cost-effective high-resolution additive nanomanufacturing technology. However, nanoscale printing of small-molecule solvent inks requires the fabrication of nano nozzles that will accommodate the considerable spreading of the printed droplets. This study documents our steps in developing a fabrication process for nanoscale printing nozzles. First, a silicon nano nozzle mold was fabricated by side-etch lift-off, ultraviolet lithography, and deep reactive ion etching. Then, the nanoscale polymer nozzle was produced by double-casting polydimethylsiloxane and a bonding process. In the application of a polymer nano nozzle for E-jet printing of ethanolic solutions of 1-hexadecanethiol, droplets with a diameter as small as 160 nm were obtained. These results indicate that a polymer nano nozzle can be well adapted to E-jet printing with a fine resolution.

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“…At present, the fabrication methods for nano-channels mainly include high-resolution machining technology [ 13 , 14 , 15 ], sacrificing layer technology [ 16 , 17 ], the crack method [ 18 , 19 ], PDMS deformation [ 20 , 21 ], molecular self-assembly [ 22 , 23 , 24 ], and nano-imprinting technology [ 25 , 26 , 27 ]. The high-resolution machining technology mentioned above uses nanoscale resolution to expose or directly write nano-channels on the substrate, which provides the advantages of flexibility, controllability, high accuracy, and good quality.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of High Aspect Ratio Nano-Channels by Thermal Nano-Imprinting and Parylene Deposition

2023

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A low-cost method of fabrication of high aspect ratio nano-channels by thermal nano-imprinting and Parylene deposition is proposed. SU-8 photoresist nano-channels were first manufactured by thermal nano-imprinting, and Parylene deposition was carried out to reduce the width of the nano-channels and increase the aspect ratio. During the process, the side walls of the SU-8 nano-channels were covered with the Parylene film, reducing the width of the nano-channels, and the depth of the channels increased due to the thickness of the Parylene film deposited on the surface of the SU-8 nano-channels, more so than that at the bottom. The influence of Parylene mass on the size of nano-channels was studied by theoretical analysis and experiments, and the deposition pressure of Parylene was optimized. The final high aspect ratio nano-channels are 46 nm in width and 746 nm in depth, of which the aspect ratio is 16. This simple and efficient method paves the way for the production of high aspect ratio nano-channels.

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SU-8 nano-nozzle fabrication for electrohydrodynamic jet printing using UV photolithography

Cited by 15 publications

References 36 publications

A Realizable Green Strategy to Negative Polyurethane Photoresists through the Application of a Silicone Resin Photoinitiator

A Realizable Green Strategy to Negative Polyurethane Photoresists through the Application of a Silicone Resin Photoinitiator

Fabrication of a Polymer Nano Nozzle for Electrohydrodynamic Small-Molecule Solvent Inkjet Printing

Fabrication of High Aspect Ratio Nano-Channels by Thermal Nano-Imprinting and Parylene Deposition

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