Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

Abstract

SummaryPatterning of materials at sub-10 nm dimensions is at the forefront of nanotechnology and employs techniques of various complexity, efficiency, areal scale, and cost. Colloid-based patterning is known to be capable of producing individual sub-10 nm objects. However, ordered, large-area nano-arrays, fully integrated into photonic or electronic devices have remained a challenging task. In this work, we extend the practice of colloidal lithography to producing large-area sub-10 nm point-contact arrays and demonstrate their circuit integration into spin-photo-electronic devices. The reported nanofabrication method should have broad application areas in nanotechnology as it allows ballistic-injection devices, even for metallic materials with relatively short characteristic relaxation lengths.

Nanotopographical surfaces for stem cell fate control: Engineering mechanobiology from the bottom

“…In colloidal lithography, self-assembled nanoparticle crystal structures with a short-range intrinsic order are created on planar surfaces to serve as masks for subsequent etching processes (Fig. 1c) [39–42]. Colloidal lithography does not possess the accuracy and on-demand control over spatial patterns it can generate, as compared to photolithography and EBL.…”

“…Colloidal lithography does not possess the accuracy and on-demand control over spatial patterns it can generate, as compared to photolithography and EBL. To generate nanotopography with different spatial patterns, colloidal lithography can utilize different crystal structures of self-assembled colloidal masks and alter incidence angle of plasma that etches the underlying surface [39–42]. …”

Stimuli-responsive microgels for controlled deposition of gold nanoparticles on surfaces

“…Nanosphere lithography (NSL) has emerged as an alternative method to fabricate ordered nanostructures over a large surface area that is low-cost and scalable. 21,22 In one example, hard polystyrene (PS) spheres were self-assembled into a hexagonal close packed structure on a substrate and used as a mask for Au deposition onto the substrate. 22 That is, Au is deposited on the substrate through the interstices between the assembled PS spheres resulting in an ordered array of Au triangles aer PS removal from the substrate.…”

Facile Fabrication of Ordered Nanostructures from Protruding Nanoballs to Recessional Nanosuckers via Solvent Treatment on Covered Nanosphere Assembled Monolayers

“…Self-assembled nanosphere arrays have aroused much attention for producing ordered nanostructures, especially nonclose-packed nanopatterns, which are of considerable technological significance in fabricating arrays of nanoballs, − nanopillars, − nanodiscs, , nanobowls, nanoneedles, and nanorings as well. , The periodic nanostructures were easily fabricated in a large area and being pursued for variety of applications, for instance, in optical devices, , data storage, biosensors, as well as lithography for multiple purposes. − Here we would like to present a facile nanosphere lithographic process using various gentle solvent treatments to produce “bottom-up” and “bottom-down” nonclose-packed patterns and to investigate their practical applications in nanolenses for optical display and nanosuckers for adhesion.…”