Sub-10-nm nanolithography with a scanning helium beam

Sidorkin, Vadim; Veldhoven, E. van; Drift, E. van der; Alkemade, P.F.A.; Salemink, H.W.M.; Maas, D.J.

doi:10.1116/1.3182742

Cited by 130 publications

(91 citation statements)

References 22 publications

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“…For example, a block copolymer pattern with a periodicity of 18 nm could be achieved by templating a 16 kg mol À 1 PS-b-PDMS block copolymer 16 using a square post array with a periodicity of 18 nm and double posts with a post spacing of 12 nm. This resolution is difficult to achieve with electron-beam lithography, but similar resolution has been achieved by helium-ion beam lithography 34 and scanning transmission electron microscopy lithography 35 . In summary, a template design based on a restricted set of tiles with post motifs provides a way to achieve a complex pattern of line segments with bends and terminations from a relatively simple template.…”

Section: Discussionmentioning

confidence: 99%

Design rules for self-assembled block copolymer patterns using tiled templates

et al. 2014

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Directed self-assembly of block copolymers has been used for fabricating various nanoscale patterns, ranging from periodic lines to simple bends. However, assemblies of dense bends, junctions and line segments in a single pattern have not been achieved by using sparse templates, because no systematic template design methods for achieving such complex patterns existed. To direct a complex pattern by using a sparse template, the template needs to encode the key information contained in the final pattern, without being a simple copy of the pattern. Here we develop a set of topographic template tiles consisting of square lattices of posts with a restricted range of geometric features. The block copolymer patterns resulting from all tile arrangements are determined. By combining tiles in different ways, it is possible to predict a relatively simple template that will direct the formation of non-trivial block copolymer patterns, providing a new template design method for a complex block copolymer pattern.

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Section: Discussionmentioning

confidence: 99%

Design rules for self-assembled block copolymer patterns using tiled templates

et al. 2014

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“…This mode allows the recording of high-contrast images of crystalline materials and crystal defects even at modest beam energies. Helium ion microscopy has already been successfully used for resist-based structuring and the feasibility of 6nm features has been demonstrated (Sidorkin et al 2009). Ion beams may also be used for sample sputtering, but the light He ions have a very low yield.…”

Section: He Ion Microscopementioning

confidence: 99%

Focused Ion Beam Lithography

Wanzenboeck¹,

Waid²

2011

Recent Advances in Nanofabrication Techniques and Applications

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“…4,7,8 Being used for nanofabrication, HIM is reported to yield 4-nm-wide lines with a pitch of 10 nm as lithography tool. 9,10 Very narrow structures with almost no overspray can be made with the gas-induced deposition. 11,12 For thin-film dicing and nanopore drilling, sub-10-nm features are now achieved.…”

Section: Introductionmentioning

confidence: 99%

Novel nanosample preparation with a helium ion microscope

Rudneva

Veldhoven²,

Malladi

et al. 2013

J. Mater. Res.

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In this article, we present novel sample preparation methods using a helium ion microscope (HIM). We report the possibility of reshaping, at room temperature, thin metal lines on an electron-transparent membrane: A set of platinum bridges with standard geometry (300 Â 200 Â 15 nm) was modified at room temperature into different shapes using focused helium (He)-ion beam. Also the applicability of the HIM as a tool for precise modification of silicon (Si) and strontium titanate (SrTiO 3 ) lamellae is shown and discussed. We demonstrated that in situ heating (e.g., at 600°C) of the samples during He-beam illumination by use of a specially developed heating stage enables production of thin Si and SrTiO 3 samples without significant artifacts. The quality of such cuts was inspected by transmission electron microscopy with high-resolution imaging, and the diffraction patterns were analyzed.

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Sub-10-nm nanolithography with a scanning helium beam

Abstract: Scanning helium ion beam lithography is presented as a promising pattern definition technique for dense sub-10-nm structures. The powerful performance in terms of high resolution, high sensitivity, and a low proximity effect is demonstrated in a hydrogen silsesquioxane resist.

Cited by 130 publications

References 22 publications

Design rules for self-assembled block copolymer patterns using tiled templates

Design rules for self-assembled block copolymer patterns using tiled templates

Focused Ion Beam Lithography

Novel nanosample preparation with a helium ion microscope

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