2013
DOI: 10.1117/12.2010364
|View full text |Cite
|
Sign up to set email alerts
|

Sub-14 nm HSQ line patterning by e-beam dose proximity effect correction assisted with designed line CD/pitch split

Abstract: New applications on memory and logic devices need to form line shape pattern below 20 nm. Most of the prior articles for studying HSQ line CD resolution applied hot or cold (non-room temperature (RT)) development, salty development, KOH-based development or high concentration TMAH developer (like 25%) to push CD resolution to below 10 nm but these methods are not standard IC process compatible with 2.38% TMAH development at RT. E-beam lithography processes are applied to investigate CD resolution on RRAM film … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 6 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?