Sub-diffraction-limited patterning using evanescent near-field optical lithography

Alkaisi, Maan M.; Blaikie, Richard J.; McNab, Sharee J.; Cheung, Rebecca; Cumming, David R. S.

doi:10.1063/1.125388

Cited by 193 publications

(103 citation statements)

References 12 publications

Supporting

Mentioning

103

Contrasting

Order By: Relevance

“…The experimental technique, providing repeatable super-resolution imaging results in an optical lithography environment, is based on previous work describing conformable-contact lithography 9,10 . These methods use flexible membranes under vacuum to ensure intimate contact between an object and an imaging layer.…”

Section: Experimental Methodsmentioning

confidence: 99%

See 1 more Smart Citation

Experimental comparison of resolution and pattern fidelity in single- and double-layer planar lens lithography

Melville

Blaikie

2006

J. Opt. Soc. Am. B

View full text Add to dashboard Cite

An experimental comparison of the performance of single-and double-layer planar lens lithography (PLL) has been carried out. A direct comparison is made with a single 50nm silver lens and a double silver lens with two 30nm layers. Sub-diffraction-limited features have been imaged in both cases, with dense grating periods down to 145nm and 170nm for the single-and doublelayered stacks, respectively. For the same total thickness of silver the resolution limit is qualitatively better for a double layer stack. However, pattern fidelity is reduced in the double layer experiments due to increased surface roughness.Finite-difference time-domain simulations are also presented to back up the experimental results.

show abstract

Section: Experimental Methodsmentioning

confidence: 99%

“…At this stage no pattern transfer has been attempted into the silicon, however this has been proven to work well by Alkaisi et al 9 for a related near-field lithography process.…”

Section: Experimental Methodsmentioning

confidence: 99%

Experimental comparison of resolution and pattern fidelity in single- and double-layer planar lens lithography

Melville

Blaikie

2006

J. Opt. Soc. Am. B

View full text Add to dashboard Cite

show abstract

“…Therefore, it has been widely used in the fabrication of surface textures. To improve the precision, optical near-field nanofabrications through an evanescent near-field optical lithography method [6] or an embedded-amplitude mask [7] are characterized. And, illuminating of microspheres as microlenses [8] realizing high throughput patterning has attracted much attention and has been widely applied in the field of micro or nano fabrication.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Nanostructures by Laser Optical Focusing

Bao¹,

Feng²,

Wang³

et al. 2017

dtetr

View full text Add to dashboard Cite

ABSTRACT* Surface structures have a broad application prospects, because the nanostructure or microstructure can improve the tribological properties. Laser processing has been widely used for microstructures due to the excellent controllability and universality and the precision of this method can be significantly increased by optical focusing. However, it is difficult to prepare nanometer scale material as focusing media. Here, a self-assembled monolayer of silica microspheres with diameter of about 900nm was formed on a bearing steel substrate and could be used as the focusing media. Large-area nanoholes were fabricated using overlapping pulses obtained through laser beam scanning. Scanning electron microscope (SEM) and profilometer characterized the shape and dimension of nanopatterns. Finally, the mechanisms of the formation of such structures depending on the number of laser pulses applied were discussed.

show abstract

“…In recent years, extensive investigations about the EOT of subwavelength metallic structures have been implemented [3,4], which have a great potential to control light and carry the promise of different applications in many areas, such as sensing [5], subwavelength optics [6], optoelectronics devices [7,8], and so on. And many efforts have also been made to explain the unique phenomena of EOT, and the existence of the surface plasmon resonance (SPR) and cavity mode (CM) [9,10] have been considered.…”

Section: Introductionmentioning

confidence: 99%

High-efficiency refractive index sensor based on the metallic nanoslit arrays with gain-assisted materials

Luo

Tao

et al. 2016

Nanophotonics

View full text Add to dashboard Cite

Abstract:We have designed and investigated a three-band refractive index (RI) sensor in the range of 550-900 nm based on the metal nanoslit array with gain-assisted materials. The underlying mechanism of the three-band and enhanced characteristics of the metal nanoslit array with gain-assisted materials, have also been investigated theoretically and numerically. Three resonant peaks in transmission spectra are deemed to be in different plasmonic resonant modes in the metal nanoslit array, which leads to different responses for the plasmonic sensor. By embedding the structure into the CYTOP with proper gain-assisted materials, the sensing performances can be greatly enhanced due to a dramatic amplification of the extraordinary optical transmission (EOT) resonance by the gain medium. When the gain values reach their corresponding thresholds for the three plasmonic modes, the ultrahigh sensitivities in three bands can be obtained, and especially for the second resonant wavelength (λ 2 ), the FOM=128.1 and FOM*= 39100 can be attained at the gain threshold of k =0.011. Due to these unique features, the designing scheme of the proposed gain-assisted nanoslit sensor could provide a powerful approach to optimize the

show abstract

Sub-diffraction-limited patterning using evanescent near-field optical lithography

Cited by 193 publications

References 12 publications

Experimental comparison of resolution and pattern fidelity in single- and double-layer planar lens lithography

Experimental comparison of resolution and pattern fidelity in single- and double-layer planar lens lithography

Fabrication of Nanostructures by Laser Optical Focusing

High-efficiency refractive index sensor based on the metallic nanoslit arrays with gain-assisted materials

Contact Info

Product

Resources

About