2007
DOI: 10.1021/la063646z
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Sub-micrometer Patterning of Proteins by Electric Lithography

Abstract: We report in this paper an electric lithographic (EL) technique to generate protein patterns with sub-micrometer resolution on a poly(N-tBOC-2-aminoethyl methacrylate) surface. In the EL process, an electric potential is applied between metal patterns on a mask and the poly(N-tBOC-2-aminoethyl methacrylate) layer to electrochemically induce the dissociation of the tBOC from the amine functional groups. Proteins are then selectively attached to the amine functional groups in the modified polymer surface areas t… Show more

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Cited by 16 publications
(25 citation statements)
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“…A novel electrochemical lithography technique was used to create patterns of biotin by local, heat-assisted release of surface protecting groups. [220] Other approaches made use of soft or probe lithography, either for direct local delivery of biotin or for creating suitable reactive patches that subsequently react with biotin derivatives. [124,199,[220][221][222][223][224][225][226][227][228][229][230] The dimensions of the fabricated SAv patterns range from micrometers to a few tens of nanometers; some of these patterns have been used for the immobilization of fluorescent proteins and antibodies.…”
Section: Namementioning
confidence: 99%
“…A novel electrochemical lithography technique was used to create patterns of biotin by local, heat-assisted release of surface protecting groups. [220] Other approaches made use of soft or probe lithography, either for direct local delivery of biotin or for creating suitable reactive patches that subsequently react with biotin derivatives. [124,199,[220][221][222][223][224][225][226][227][228][229][230] The dimensions of the fabricated SAv patterns range from micrometers to a few tens of nanometers; some of these patterns have been used for the immobilization of fluorescent proteins and antibodies.…”
Section: Namementioning
confidence: 99%
“…Templates have been fabricated through controlling the placement of whole ECM molecules (or moieties present in the ECM to which integrins bind) on the surface. These nano-or 30 electron beam lithography, 31 and selfassembly. 32 As an example of self-assembly, a patterning method using block copolymer nanolithography (BCN) has been developed recently.…”
Section: Introductionmentioning
confidence: 99%
“…4349 One common technique exploits a photolithographic resist to protect regions of the surface during aninitial functionalization. Upon removal of the resist, theopen regions are backfilled with a second functionalityby immersion.…”
Section: Introductionmentioning
confidence: 99%