Techniques to make metal films thinner and better remain an unexplored area of research that still has important technical problems. In particular, the fabrication of metal films is widely encountered in the field of nano-optics, and various surface plasmon phenomena, including light focusing, have been observed more in metal films with better conductivities. Here, we investigated how the qualities of the metal thin films were changed by varying the deposition conditions in an electron beam evaporator. We analyzed the metal films by using electrical and optical methods. In fact, the pumping time of the vacuum chamber had a greater effect on the quality of the metal film than the difference in the lowest vacuum pressure. For the production of a metal film with a conductivity as good as that for the bulk, an electron beam evaporator having a loading chamber in addition to a main chamber in which the vacuum pressure is always kept to a minimum value as low as 10 −10 torr is required.