2006
DOI: 10.1063/1.2168024
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Subband and transport calculations in double n-type δ-doped quantum wells in Si

Abstract: The Thomas-Fermi approximation is implemented in two coupled n-type ␦-doped quantum wells in Si. An analytical expression for the Hartree-Fock potential is obtained in order to compute the subband level structure. The longitudinal and transverse levels are obtained as a function of the impurity density and the interlayer distance. The exchange-correlation effects are analyzed from an impurity density of 8 ϫ 10 12 to 6.5ϫ 10 13 cm −2. The transport calculations are based on a formula for the mobility, which all… Show more

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Cited by 25 publications
(21 citation statements)
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“…We have used standard parameters for n-and p-type Silicon [5,10]. The donor and acceptor concentrations varies from 1 × 10 12 cm −2 to 1 × 10 14 cm −2 .…”
Section: Resultsmentioning
confidence: 99%
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“…We have used standard parameters for n-and p-type Silicon [5,10]. The donor and acceptor concentrations varies from 1 × 10 12 cm −2 to 1 × 10 14 cm −2 .…”
Section: Resultsmentioning
confidence: 99%
“…Meanwhile the carrier concentration in this kind of systems is ultra high, the mobility is very low, which is opposite to the behavior in GaAs/AlGaAs systems [4]. An improvement in the conductivity not properly the mobility could be reach via the coupling of deltadoped layers [5]. The main proposal relies in finding the interwell distance at which the mobility is maximum in conjunction with the high carrier density coming from the two delta-doped planes, such that the conductivity -the product of the mobility and the carrier densityenhances [6].…”
Section: Introductionmentioning
confidence: 92%
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