Submicron Lithography

Wilkinson, C. D. W.; Beaumont, S.P.

doi:10.1007/978-1-4899-2382-0_11

Cited by 3 publications

(2 citation statements)

References 27 publications

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“…8 Following coating with the first PMMA layer ͑BDH 8%͒ and baking at 180°C for 90 min, the second layer ͑ELV 4%͒ is spun on and baked, usually for about 16 h, at 180°C. 8 Following coating with the first PMMA layer ͑BDH 8%͒ and baking at 180°C for 90 min, the second layer ͑ELV 4%͒ is spun on and baked, usually for about 16 h, at 180°C.…”

Section: B Patterning For Element Definitionmentioning

confidence: 99%

“…8 As noted above, the pattern in resist is overcoated by a thin layer of metal ͑preferably of thickness one-third or less of the thickness of the resist͒ and placed in a strong solvent to dissolve the resist and leave the required metal pattern on the substrate. In the former, a lithographic method is used to define the required pattern in a resist on the substrate of interest followed by film deposition and lift off.…”

Section: Introductionmentioning

confidence: 99%

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High resolution patterning of thin magnetic films to produce ultrasmall magnetic elements

Khamsehpour¹,

Wilkinson²,

Chapman³

et al. 1996

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Lithographic and dry etching techniques have been used to fabricate submicron and micron sized elements from magnetic thin films. Through a combination of electron beam lithography and reactive ion etching using CF 4 /O 2 followed by CH 4 /H 2 /O 2 , well defined elements with lateral dimensions as small as 24 nm have been produced. The films were deposited on thin electron-transparent Si 3 N 4 membranes so that the structural and micromagnetic properties of the elements could be studied by transmission electron microscopy. Lorentz microscopy on micron sized permalloy elements has confirmed that the magnetic integrity is maintained after patterning and a comparison with similar sized elements produced using a lift off route is given.

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Section: B Patterning For Element Definitionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

High resolution patterning of thin magnetic films to produce ultrasmall magnetic elements

Khamsehpour¹,

Wilkinson²,

Chapman³

et al. 1996

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Application of electron beam lithography to pattern sub-micron features in a beam forming grating

Parkes

Thoms

Wilkinson

1994

Microelectronic Engineering

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The fabrication and magnetic properties of acicular magnetic nano-elements

et al. 1996

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Two different lithographic techniques have been developed for fabricating magnetic nano-elements on ultra-thin electron-transparent substrates thereby allowing transmission electron microscopy to be used to investigate their properties.Here we describe studies of elements of micropolycrystalline permailloy and cobalt whose thicknesses lie in the range 20-30nm. Bright field images show that a high degree of edge acuity is attainedl and elements with lateral dimensions =25nm have been produced. Lorentz microscopy has provided unique insight into the detailed magnetisation reversal mechanisms in acicular elements with widths in the range 100-300nm. In cobalt elements a single domain occupies most of the volume with complex domain structures existing very close to the ends; switching fields increase-markedly with decreasing element width but are substantially independent of element length. The reversal mechanism is found to involve the propagation of a small "reversing" domain struciture along the element length. In permalloy, extensive domain structures are observed in all but the narrowest elements in the remanent state. The response to applied fields is described.

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Submicron Lithography

Cited by 3 publications

References 27 publications

High resolution patterning of thin magnetic films to produce ultrasmall magnetic elements

High resolution patterning of thin magnetic films to produce ultrasmall magnetic elements

Application of electron beam lithography to pattern sub-micron features in a beam forming grating

The fabrication and magnetic properties of acicular magnetic nano-elements

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