Submicron-scale light modulation device driven by current-induced domain wall motion for electro-holography

Higashida, Ryo; Funabashi, Nobuhiko; Aoshima, Ken-ichi; Machida, Kenji

doi:10.35848/1347-4065/ab8576

Cited by 6 publications

(2 citation statements)

References 30 publications

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“…SLMs with such a high resolution and a small pixel pitch are difficult to develop. Although many efforts have been made to develop SLMs with ultra-high resolution and a sub-micron pixel pitch [4][5][6][7][8][9], substantial time is required to develop SLMs that can provide an effective practical viewing zone angle and screen size. Several techniques that do not depend on pixel pitch reduction and an increase in SLM resolution have been developed for enlarging the viewing zone angle and screen size.…”

Section: Introductionmentioning

confidence: 99%

Enlargements of Viewing Zone and Screen Size of Holographic Displays Using MEMS SLM Combined with Scanning Systems

Takaki

2022

Applied Sciences

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The problems of conventional holographic display techniques, which are the requirements of a sub-micron pixel pitch and ultra-high resolution for spatial light modulators (SLMs) to enlarge the viewing zone and screen size, can be addressed using microelectromechanical systems (MEMS) SLMs combined with spatial scanning systems. Various scanning systems have been efficiently combined with high-speed image generation of MEMS SLMs based on the time-multiplexing technique. The horizontal scanning system enlarged the viewing zone and screen size, the circular scanning system provided 360° three-dimensional (3D) images, and the RGB scanning system generated color 3D images. The screen size can be increased scalably using a multichannel system based on the space-multiplexing technique. The use of a short laser pulse illumination system eliminates the mechanical scanning system and greatly simplifies the display system. The measurements of the accommodation responses of human eyes showed that 3D images generated by the screen scanning holographic display have a possibility to solve the visual fatigue issue caused by the vergence–accommodation conflict, which prevents the long-time usage of conventional 3D displays.

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Section: Introductionmentioning

confidence: 99%

Enlargements of Viewing Zone and Screen Size of Holographic Displays Using MEMS SLM Combined with Scanning Systems

Takaki

2022

Applied Sciences

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“…With recent advances in nanoscience and nanotechnology, nanometer-scale resolution is increasingly needed for emerging applications. , For example, microfluidic chips with submicron structures have been developed for advanced biomedical applications ( e.g ., bioanalysis, cell regulation, drug delivery). − Additionally, submicron- and nanoscale structures can be integrated into optic and electric devices ( e . g ., optoelectronic circuits, displays, plasmonic sensors) for improved performance, sensitivity, and efficiency. − …”

mentioning

confidence: 99%

Single-Step Dual-Layer Photolithography for Tunable and Scalable Nanopatterning

Liu

Wang

et al. 2021

ACS Nano

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Conventional photolithography, due to its scalability, robustness, and straightforward processes, has been widely applied to micro-and nanostructure manufacturing in electronics, optics, and biology. However, optical diffraction limits the ultimate resolution of conventional photolithography, which hinders its potential in nanoscale patterning for broader applications. Here, we introduce a derivative of conventional photolithography for nanoscale patterning called dual-layer photolithography (DLPL), which is based on the controlled exposure and development of overlapping positive and negative photoresists. In a typical experiment, substrates are sequentially coated by two layers of photoresists (both positive and negative). Then, we purposefully control the exposure time to generate slightly larger features in the positive photoresist than those in the negative photoresist. After development, their overlapping areas become the final features, which outline the original features. We demonstrate line widths down to 300 nm here, which can be readily improved with more precise control. By adjusting the lithography parameters and material deposition, the feature sizes, shapes (e.g., rings, numbers, letters), line widths (300−900 nm), and materials (e.g., SiO 2 , Cr, and Ag) of these features can be independently controlled. Combined with anisotropic etching, more complex three-dimensional nanostructures can be fabricated as well, as we demonstrate here with Si. We further fabricate photodetectors as an example application to show that these nanostructures fabricated by DLPL can be used to promote light-trapping MAPbI 3 perovskite films to achieve good photoelectric properties. This strategy is not limited to ultraviolet photolithography and may also be incorporated into other energetic beam-based lithographic approaches, including deep and extreme ultraviolet photolithographies and electron beam lithography, to enhance their resolution.

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Enhancement of a Diffracted Beam in a Domain–Wall–Motion-Type Light Modulator Array

Higashida¹,

Funabashi²,

Aoshima³

et al. 2022

IEEE Trans. Magn.

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Submicron-scale light modulation device driven by current-induced domain wall motion for electro-holography

Cited by 6 publications

References 30 publications

Enlargements of Viewing Zone and Screen Size of Holographic Displays Using MEMS SLM Combined with Scanning Systems

Enlargements of Viewing Zone and Screen Size of Holographic Displays Using MEMS SLM Combined with Scanning Systems

Single-Step Dual-Layer Photolithography for Tunable and Scalable Nanopatterning

Enhancement of a Diffracted Beam in a Domain–Wall–Motion-Type Light Modulator Array

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