1984
DOI: 10.1007/bf00614761
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Subpicosecond carrier trapping in high-defect-density amorphous Si and GaAs

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1985
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Cited by 60 publications
(14 citation statements)
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“…The As concentration dependence was explained by the increase of the broadband absorption with As + implantation, leading to negative ∆n and thus negative ∆R, by Kramers-Kronig relation. Negative ∆R was observed earlier in amorphous GaAs [7] and Si [7,8] which was attributed to transitions involving midgap states. The sign change of ∆R in GaMnAs is somewhat similar to As + -ion implanted GaAs.…”
Section: Resultsmentioning
confidence: 89%
“…The As concentration dependence was explained by the increase of the broadband absorption with As + implantation, leading to negative ∆n and thus negative ∆R, by Kramers-Kronig relation. Negative ∆R was observed earlier in amorphous GaAs [7] and Si [7,8] which was attributed to transitions involving midgap states. The sign change of ∆R in GaMnAs is somewhat similar to As + -ion implanted GaAs.…”
Section: Resultsmentioning
confidence: 89%
“…In amorphous GaAs ͑Ref. 11͒ and Si, 11,12 negative ⌬R for E Ͼ E g was observed, which was attributed to the defect induced absorption associated with transitions involving midgap states. In crystalline LT GaAs, Gupta et al also observed initial negative ⌬R for E Ͼ E g .…”
mentioning
confidence: 94%
“…1(b), the negative signal around zero delay in the results for the GaMnAs sample is due to FCA, which is enhanced with low-temperature growth due to the presence of defects. 41,42,47,52 The subsequent rise, which is characterized by a time constant of 1.8 ps, is attributed to the trapping of a portion of the electrons into As Ga defects, after which a positive signal is observed due to a DIA response associated with the trapped carriers.…”
mentioning
confidence: 98%