The fabrication of well‐defined, atomically sharp substrate surfaces over a wide range of lattice parameters is reported, which is crucial for atomically regulated epitaxial growth of complex oxide heterostructures. By applying a framework for controlled selective wet etching of complex oxides on the stable rare‐earth scandates (REScO3), apseudocubic = 0.394 – 0.404 nm, the large chemical sensitivity of REScO3 to basic solutions is exploited, which results in reproducible, single‐terminated surfaces. Time‐of‐flight mass‐spectroscopy measurements show that after wet etching the surfaces are predominantly ScO2 ‐terminated. Moreover, the morphology study of SrRuO3 thin‐film growth gives no evidence for mixed termination. Therefore, it is concluded that the REScO3 surfaces are completely ScO2 ‐terminated.