Substrate-temperature dependent structure and composition variations in RF magnetron sputtered titanium nitride thin films

Research on titanium nitride thin films deposited by reactive magnetron sputtering for MEMS applications

“…Titanium nitride is utilized in a wide range of applications for space, biomedicine, microelectronics industry, and so on due to its excellent physical, chemical, electrical and mechanical properties [1][2][3][4][5]. This type of ceramic can be employed as diffusion barrier in microelectronics, protective coatings for biomedical devices, hard and decorative coatings of mechanical tools or for manufacturing micro-gap discharge devices.…”

Investigation of electrical and optical properties of low temperature titanium nitride grown by rf-magnetron sputtering

“…Most scientific articles reports dc-magnetron sputtering at 300-400 0 C [3][4][5] or rf-reactive magnetron sputtering in 100% nitrogen atmosphere [6]. Heating up to 600 0 C is used for obtain good stoichiometry of TiN.…”

A Comparative study of Wear and tool life of HSS TiN coated end mills and WC uncoated end mills

“…The atomic ratio of Ti : N of TiN coated HSS end mills was 1:1.69, it had a higher than normal range value and the hardness of the coating surface is 1236.7 HV , lower than the general hardness of TiN about 30% . However, the variation of Ti: N ratio is a function of temperature [9] and therefore the hexagonal -Ti phase could dissolve up to 15 atomic % nitrogen. [10].…”