Substrate temperature influence on boron carbide coatings grown by the PLD technique

Castillo, H.A.; Vélez, Juan Manuel; Cruz, W. de la

doi:10.1016/j.surfcoat.2010.12.043

Cited by 18 publications

(13 citation statements)

References 47 publications

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“…In 134 addition, there is intensity between these two peaks. It can be due to C-B bonds [26], 135 which are expected if B is dissolved into TiC. However, it can also be due to an 136 interfacial contribution, C-Ti*, of C at a matrix/TiC interface described by Lewin et 137 al.…”

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confidence: 99%

Ti–B–C nanocomposite coatings deposited by magnetron sputtering

Lauridsen

Nedfors

Jansson

et al. 2012

Applied Surface Science

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9Ti-B-C nanocomposite coatings with a B content of 8-17 at. %, have been deposited by 10 magnetron sputtering from B 4 C, Ti, and C targets. X-ray diffraction, photoelectron 11 spectroscopy, and electron microscopy show that the coatings consist of nanocrystalline 12 (nc) TiC:B embedded in a matrix of amorphous (a) C, BC x ,TiO x and BO x . The fraction of 13 amorphous phase scales with the Ti concentration, where the matrix predominantly 14 consists of free C with some BC x in coatings with a C/Ti ratio >1, while the matrix 15 predominantly consists of BC x with some free C in coatings with a C/Ti ratio <1. Nc-16TiC:B/a-BC x /a-C coatings with low amount of free C exhibit a contact resistance 17 comparable to the contact resistance of an Ag sputtered coating at loads of ~1 N against 18 an Au probe, despite the O content of ~16 at. %.

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confidence: 99%

Ti–B–C nanocomposite coatings deposited by magnetron sputtering

Lauridsen

Nedfors

Jansson

et al. 2012

Applied Surface Science

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“…This morphology could be compared with that reported in previous studies, using UV nanosecond laser pulses [11,12,15], where continuous films with different degrees of roughness were obtained.…”

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confidence: 65%

“…A c c e p t e d M a n u s c r i p t 4 include chemical vapor deposition (CVD) [6,7], laser-assisted CVD [8,9], magnetron sputtering [10] and pulsed laser deposition (PLD) [11][12][13][14][15][16].…”

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confidence: 99%

“…PLD studies of boron carbide have shown that morphology, stoichiometry and crystallinity of the deposits are very sensitive to variations of the laser parameters (pulse duration and energy and wavelength) and to deposition conditions, such as the atmosphere where ablation is carried out and the orientation, type and temperature of the substrate [11][12][13][14][15]. The in-situ study of the B 4 C laser ablation plasma via optical emission spectroscopy and low-order harmonic generation has been proposed as a guide for controlled thin film synthesis through PLD [16][17][18].…”

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confidence: 99%

“…The in-situ study of the B 4 C laser ablation plasma via optical emission spectroscopy and low-order harmonic generation has been proposed as a guide for controlled thin film synthesis through PLD [16][17][18]. Mostly amorphous B 4 C films have been grown by nanosecond UV laser ablation using the wavelengths of 266 and 248 nm [11,12,15]. Zemski et al [14] have described boron carbide deposits with different morphologies by ablation with 532 nm, nanosecond laser pulses using Si (100) substrates placed at varying orientations with respect to the target.…”

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confidence: 99%

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