Silicon carbide (SiC) is a typical wide band-gap semiconductor material, and exhibit excellent physical properties like high electron saturated drift velocity, high breakdown field, etc. SiC material contains many polytypes, among them, 4H-SiC is almost the most popular polytype as it possesses suitable band-gap and high electron saturated drift velocity. In order to produce 4H-SiC power devices with high barrier voltage over several thousand volts, minority carrier lifetime of 4H-SiC single crystal must be carefully managed. In general, both bulk defects and surface defects in 4H-SiC can reduce the minority carrier lifetime. Nevertheless, as surface defects have received less attention in publications, this study reviews surface defects in 4H-SiC. Surface defects in 4H-SiC can be classified into a number of categories like triangle defect、pit、carrot, etc. This paper discusses each one individually followed by the introduction of industrial feasible methods to characterize them. Subsequently, the impact of surface defects on minority carrier lifetime is analyzed and discussed. At last, a particular emphasis is put on discussing various passivation schemes and their effects on minority carrier lifetime of 4H-SiC single crystal. Overall, this review paper aims to help young researchers comprehend surface defects in 4H-SiC single crystal material.