1999
DOI: 10.1016/s0022-0248(98)00813-6
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Sulphur diffusion in CdTe and the phase diagram of the CdS–CdTe pseudo-binary alloy

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Cited by 42 publications
(23 citation statements)
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“…131 The formation of a CdS x Te 1Àx layer at the interface results, with x not exceeding 0Á06 in accordance with the CdTe/CdS phase diagrams, though layers of higher S content may grow under non-equilibrium conditions. 132,133 The diffusion of S decreases the thickness of the CdS film and can eventually lead to the formation of shunts across the CdS/CdTe junction. Therefore, a thermal treatment of the CdS layer prior to CdTe deposition is frequently employed.…”
Section: Sodium Incorporation In Cigsmentioning
confidence: 99%
“…131 The formation of a CdS x Te 1Àx layer at the interface results, with x not exceeding 0Á06 in accordance with the CdTe/CdS phase diagrams, though layers of higher S content may grow under non-equilibrium conditions. 132,133 The diffusion of S decreases the thickness of the CdS film and can eventually lead to the formation of shunts across the CdS/CdTe junction. Therefore, a thermal treatment of the CdS layer prior to CdTe deposition is frequently employed.…”
Section: Sodium Incorporation In Cigsmentioning
confidence: 99%
“…In this letter numerical simulations of diffusion are carried out to determine its impact on photovoltaic device performance. The diffusion profile is calculated using diffusion coefficients for sulfur in bulk CdTe [15]. It has been shown that this satisfactorily reproduces the diffusion profile measured in real devices [8], so that the simulations are relevant to current device fabrication methodologies.…”
Section: Manuscriptmentioning
confidence: 73%
“…525C isothermal sulfur diffusion profiles were calculated for 'annealing' times of 10, 100, 200, 300, 400 and 500 mins, using experimental diffusion coefficients for sulfur in bulk CdTe [15]. 525C/10 mins corresponds to the close space sublimation deposition conditions for CdTe in one of our labs (Liverpool).…”
Section: N V For Cdsmentioning
confidence: 99%
“…Indeed, if we take into account the maximum values of the diffusivity of sulfur in single crystal CdTe found by Lane et al [17], we obtain diffusion length of about 20 and 60 nm for sulfur in CdTe at 600 o C (30 s) and 650 o C (60 s), respectively [the use T G (time) values correspond to our deposition conditions]. In consideration of this result we conclude that spatially integrated experiments revealing intermixed layers as thick as several 100 nm or few µm are most probably strongly influenced by fast diffusion of sulfur within grain boundaries and extended defects [3,7].…”
Section: Inspection Of the Cds/cdte Interface Region At The Cleaved Edgementioning
confidence: 99%