Superconducting and structure properties of niobium nitride prepared by rf magnetron sputtering

Cukauskas, E. J.; Carter, W. L.; Qadri, S. B.

doi:10.1063/1.335442

Cited by 63 publications

(18 citation statements)

References 18 publications

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“…The dissociation energies of NH 3 and CH 4 have been reported as 460 and 431.5 kJ/mole, respectively. 11,35 Hence, the activation energy of 507 kJ/mole in this study is mainly correlated to the activation energies of NH 3 and CH 4 dissociation. Moreover, the deposition of carbon films on the substrate needs adequate amount of carbon species in the gas phase (or sufficient residence time for carbon species to stay in the deposition zone).…”

Section: Discussionmentioning

confidence: 98%

Effects of Ammonia Addition on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

Lin

Lai

Liu

et al. 2011

J. Electrochem. Soc.

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When ammonia is added in methane to form carbon films using thermal chemical vapor deposition, effects of the ammonia/methane ratio on the deposition rate and microstructures of carbon films are investigated. Meanwhile, effects of the deposition temperature, working pressure, and residence time on the deposition rate are also considered. Experimental results indicate that as the ammonia/methane rate increases, the deposition rate of carbon films decreases, and also, the ordered degree, nano-crystallite size, and sp2 carbon atoms of carbon films increase. Nevertheless, if the deposition temperature, working pressure, and residence time increase, the deposition rate of carbon films increases. The relationship between the deposition rate and deposition process parameters is formulated. The deposition process is controlled by the process to create mono-carbon and bi-carbon species in carbon films. Moreover, one mono-nitrogen will suppress about three mono-carbons to form carbon films. Few nitrogen and hydrogen atoms are incorporated into carbon films. The activation energy (507 kJ/mole) of carbon deposition is related to the activation energies of methane and ammonia dissociation. If the working pressure is smaller than a threshold value (30 kPa) or the residence time is shorter than a threshold value (1.5 s), no film is formed

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Section: Discussionmentioning

confidence: 98%

Effects of Ammonia Addition on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

Lin

Lai

Liu

et al. 2011

J. Electrochem. Soc.

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“…Hence, several alternative nitrogen sources have been considered, such as hydrazine (N 2 H 4 ), 1,1-dimethylhydrazine ((CH 3 ) 2 NNH 2 ), and hydrogen azide (HN 3 ) [25]. Hydrazine and 1,1-dimethylhydrazine have been suggested as alternatives to NH 3 because the NH 2 -NH 2 bond strength (71 kcal/mol) [26] in these molecules is much lower than the N-H bond strength (110 kcal/mol) in NH 3 [27]. However, both hydrazine and 1,1-dimethylhydrazine are toxic and flammable which deters utilization.…”

Section: Ammonia Pyrolysis Pathwaymentioning

confidence: 98%

An overview of gallium nitride growth chemistry and its effect on reactor design: Application to a planetary radial-flow CVD system

Parikh

Adomaitis

2006

Journal of Crystal Growth

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“…Coating deposition parameters, such as the substrate temperature, the flow rate, the energy of atoms and ions incident on the surface of the growing coating, and the deposition rate, have a significant effect on the chemical composition and structure of the coating. It was found that it is necessary to provide a high substrate temperature [53,54] or introduce impurities [8,[55][56][57][58][59][60]] to obtain a superconducting phase of NbN with a critical temperature of about 16 K. The main feature of the currently available magnetron sputtering method [9][10][11] is the possibility of depositing coatings without introducing impurities or heating the substrate to high temperatures.…”

Section: Introductionmentioning

confidence: 99%

“…A potential application of niobium nitrides in engineering is in the design of devices based on a superconductor-insulator-superconductor (SIS) junction. Superconducting devices with SIS junctions are prepared from materials based on Pb, Nb, and NbN [2,[3][4][5][6][7][8][9][10][11][12][13][14]. NbN-based coatings are used in the design of large-scale Josephson integrated logic circuits [15][16][17][18], bolometers [19][20][21][22][23][24], and superconducting singlephoton detectors [25][26][27][28][29][30].…”

Section: Introductionmentioning

confidence: 99%

Structure and physicomechanical properties of NbN-based protective nanocomposite coatings: A review

Pogrebnjak

Rogoz

Бондар

et al. 2016

Prot Met Phys Chem Surf

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Abstract-This review summarizes the present-day achievements in the study of the structure and properties of protective nanocomposite coatings based on NbN, NbAlN, and NbSiN prepared by a variety of modern deposition techniques. It is shown that a change in deposition parameters has a significant effect on the phase composition of the coatings. Depending on the magnitude of negative potential on the substrate, the pressure of nitrogen or a nitrogen-argon mixture in the chamber, and the substrate temperature, it is possible to obtain coatings containing different phases, such as NbN and SiN x (Si 3 N 4 ), AlN, and NbAl 2 N. It is found that, in the case of formation of the ε-NbN phase, the coatings become very hard; their hardness achieves values on the order of 53 GPa. At the same time, they remain thermally stable at temperatures of up to 600°C, chemically inert, and resistant to wear. The effect of the nanograin size, the volume fraction of boundaries and interfaces, and the point defect concentration on the physicomechanical properties of these coatings is described. Niobium nitride-based coatings can be used in superconducting systems and single-photon detectors; they are capable of operating under the action of strong magnetic fields of up to 20 T; they can be used in integrated logic circuits and applied as protective coatings of machine parts, edges of cutting tools, etc.

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Superconducting and structure properties of niobium nitride prepared by rf magnetron sputtering

Cited by 63 publications

References 18 publications

Effects of Ammonia Addition on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

Effects of Ammonia Addition on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

An overview of gallium nitride growth chemistry and its effect on reactor design: Application to a planetary radial-flow CVD system

Structure and physicomechanical properties of NbN-based protective nanocomposite coatings: A review

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