2011
DOI: 10.1002/cvde.201106921
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Supercritical Fluid Chemical Deposition as an Alternative Process to CVD for the Surface Modification of Materials

Abstract: Taking the desirable attributes of CVD and aqueous plating techniques while minimizing the disadvantages of each, supercritical fluid chemical deposition (SFCD) demonstrates itself to be a promising process alternative to enable the fabrication of nanostructured devices. This paper gives information about the SFCD process for metal deposition as an alternative to CVD through various examples of inorganic deposition (films or nanostructures). In particular, the use of SFCD will be demonstrated for the surface m… Show more

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Cited by 33 publications
(18 citation statements)
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“…Supercritical fluid chemical deposition (SFCD) process mainly developed with supercritical carbon dioxide (scCO2) can also be an alternative method that enables the fabrication of nanostructured films in an environmentally friendly manner and from a scalable technology [10][11][12][13][14]. SCFD technique is a one-pot, multi-step process that involves, the dissolution of a metallic precursor in a supercritical fluid followed by a chemical reaction (i.e.…”
Section: Introductionmentioning
confidence: 99%
“…Supercritical fluid chemical deposition (SFCD) process mainly developed with supercritical carbon dioxide (scCO2) can also be an alternative method that enables the fabrication of nanostructured films in an environmentally friendly manner and from a scalable technology [10][11][12][13][14]. SCFD technique is a one-pot, multi-step process that involves, the dissolution of a metallic precursor in a supercritical fluid followed by a chemical reaction (i.e.…”
Section: Introductionmentioning
confidence: 99%
“…Massive efforts have been made and readers interested in the advancements in the field may find comprehensive reviews and selected examples. 61,[81][82][83][84][199][200][201][202][203][204][205][206][207][208][209][210][211][212][213][214] Supercritical CO2 can enhance the solubility of H2 in toluene 215 to create a homogeneous reductive environment favourable for the reductive synthesis of metal NPs. 51,87 As an example, Pd NPs (2-4 nm) were prepared in toluene flows by hydrogen reduction of Pd(ii) bis(hexafluoroacetylacetonate) and their surfaces were in situ bonded to different functional ligands solubilized in toluene and introduced during the synthesis.…”
Section: Carbon Dioxidementioning
confidence: 99%
“…Chemical Deposition (SFCD) [53,54]. This deposition method allows decorating the surface of a particle from supported nanoparticles to layered architecture ( Figure 3a).…”
Section: Surface Functionalization Of Ferroelectric Particles By Supementioning
confidence: 99%