2005
DOI: 10.1021/la0521948
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Superhydrophobic CFxCoating via In-Line Atmospheric RF Plasma of He−CF4−H2

Abstract: Stable superhydrophobic coatings on various substrates are attained with an in-line atmospheric rf plasma process using CF4, H2, and He. The coating layer is composed of CFx nanoparticulates and has an average roughness of approximately 10 nm. This roughness is much smaller than other surfaces reported for superhydrophobicity in the literature. The superhydrophobic coatings are produced on both metallic and insulating substrates without any need of separate microroughening or vacuum lines.

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Cited by 135 publications
(91 citation statements)
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“…Inspired by surface engineering found in nature, and using the concepts provided by the Wenzel and Cassie-Baxter models of wetting [8,9], the methodologies for preparing superhydrophobic surfaces can be generally categorized into the 'top-down' and 'bottom-up' approaches as a first step to create a specific surface roughness. Top-down approaches encompass lithographic and template-based techniques [10], laser ablation technique [11] and plasma treatment of the surfaces [12,13]. Bottom-up approaches mostly involve self-assembly and self-organization [14], such as chemical bath deposition (CBD) [15,16], chemical vapor deposition (CVD) [17] and electrochemical deposition [18].…”
Section: Introductionmentioning
confidence: 99%
“…Inspired by surface engineering found in nature, and using the concepts provided by the Wenzel and Cassie-Baxter models of wetting [8,9], the methodologies for preparing superhydrophobic surfaces can be generally categorized into the 'top-down' and 'bottom-up' approaches as a first step to create a specific surface roughness. Top-down approaches encompass lithographic and template-based techniques [10], laser ablation technique [11] and plasma treatment of the surfaces [12,13]. Bottom-up approaches mostly involve self-assembly and self-organization [14], such as chemical bath deposition (CBD) [15,16], chemical vapor deposition (CVD) [17] and electrochemical deposition [18].…”
Section: Introductionmentioning
confidence: 99%
“…Top-down approaches encompass lithographic and template-based techniques, 26 and plasma treatment of the surfaces. 27 Bottomup approaches involve mostly self-assembly and self-organization 28 as for instance chemical deposition, 29 layer-by-layer (LBL) deposition, 30 hydrogen bonding, 31 and colloidal assemblies. 32 There are also methods based on the combination of both bottom-up and top-down approaches, for example, casting of polymer solution and phase separation, 33 and electrospinning.…”
mentioning
confidence: 99%
“…[40][41][42] With different plasma deposition techniques also contact angles of water in the range of 150° to 170° are reached on textile substrates. 43,44 In this technique the type of monomer used for plasma deposition is significant for the gained hydrophobic effect. Suitable monomers are here hexamethyldisiloxane HMDSO and tetrafluoromethane CF 4 .…”
Section: Hydrophobic Propertiesmentioning
confidence: 99%
“…Suitable monomers are here hexamethyldisiloxane HMDSO and tetrafluoromethane CF 4 . 43,44 Such high contact angle values are often summarized under the terms superhydrophobic properties or superhydrophobic textiles. [45][46][47] Therefore, in relation to other hydrophobic recipes for textile treatment the actual developed Tung Oil recipe can be ranked in the range of moderate hydrophobic agents but not used for realization of superhydrophobic textiles.…”
Section: Hydrophobic Propertiesmentioning
confidence: 99%