Superior nanopatterns <i>via</i> adjustable nanoimprint lithography on aluminum oxide in high-K thin films with ultraviolet curable polymer

Oh, Jin Young; Kim, Eun‐Mi; Heo, Gi-Seok; Kim, Dong Hyun; Lee, Dong‐Wook; Jeong, Hae‐Chang; Seo, Dae Shik

doi:10.1039/d1ra08425a

Cited by 1 publication

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“…The UV curable polymer used in this study was contained in the UV photocuring agent (Irgacure 2959; Sigma‐Aldrich, Ciba) by 0.1 M, and it comprised of three materials; dipentaerythritol hexaacrylate (DPHEA), tripropyleneglycol diacrylate (TPGDA), and 2‐hydroxyethyl acrylate (2HEA) at the same ratio 38 . The materials were obtained by Sigma‐Aldrich.…”

Section: Methodsmentioning

confidence: 99%

Well‐ordered nanostructured organic/inorganic hybrid thin film construction via UV nanoimprint lithography applicable to liquid crystal systems

Lee

Won

Kim

et al. 2022

J of Applied Polymer Sci

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In this study, a well‐ordered unidirectional nanostructure was successfully imprinted on a UV curable polymer/indium oxide hybrid film using UV nanoimprint lithography (NIL). The surface morphologies of the hybrid films were analyzed by atomic force microscopy (AFM), and the uniform nanostructure with a period of 820 nm and height of 30 nm was observed on a 6 min UV‐irradiated film by line profile from AFM. The chemical modification of the films according to UV irradiation time was analyzed by X‐ray photoelectron spectroscopy. The nanopatterned hybrid film was applied to the liquid crystal (LC) alignment layer and the polarized optical microscopy and pretilt angle analysis demonstrated the highly uniform and homogeneous LC alignment state. The unidirectional nanostructure guided the LCs orientation and the aligned surface anisotropy which induces the uniform LC alignment. The hybrid film chemical affinity was analyzed by contact angle measurement, and the increased surface energy after UV irradiation contributed to the homogeneous LC alignment. Therefore, various organic/inorganic hybrid films can be used for nanostructure construction via UV NIL, and it has a high potential for application in diverse LC systems.

show abstract

Section: Methodsmentioning

confidence: 99%

Well‐ordered nanostructured organic/inorganic hybrid thin film construction via UV nanoimprint lithography applicable to liquid crystal systems

Lee

Won

Kim

et al. 2022

J of Applied Polymer Sci

Self Cite

View full text Add to dashboard Cite

show abstract

Superior nanopatterns via adjustable nanoimprint lithography on aluminum oxide in high-K thin films with ultraviolet curable polymer

Abstract: The present study substantiate that ultraviolet-nanoimprint lithography (UV-NIL) can be used to transfer a one-dimensional nano-pattern onto a high-k thin film of aluminum oxide mixed with a UV photocuring agent.

Cited by 1 publication

References 24 publications

Well‐ordered nanostructured organic/inorganic hybrid thin film construction via UV nanoimprint lithography applicable to liquid crystal systems

Well‐ordered nanostructured organic/inorganic hybrid thin film construction via UV nanoimprint lithography applicable to liquid crystal systems

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