“…14 As reported before, multilayered MnBi/Al thin films or, in general, MnBi thin films with a small Al content exhibit a clear reduction of the MnBi grain size 4,22,[31][32][33] in comparison to pure MnBi films of similar thickness without a significant change of the MO performance. 4,22,31,32 A cosputtering technique has been employed, which leads to a MnBi grain size of only 20 nm without using any dopants. 34 In the MnBi/Al multilayered films reported the average MnBi grain size becomes smaller than approximately 50 nm and a dramatic change in the magnetization reversal process has been observed from one driven by domain wall motion toward coherent rotation.…”