Surface chemistry and hydrolysis of a hydrophobic-treated aluminium nitride powder

Binner, Jon; Zhang, Yongheng

doi:10.1016/j.ceramint.2004.06.012

Cited by 22 publications

(21 citation statements)

References 24 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…XPS is an analytical technique that has been widely used to characterize AlN powders [1] and AlN films formed by various deposition methods such as direct current (dc) magnetron reactive sputtering, [2] closed-field unbalanced magnetron sputtering, [3] metal-organic chemical vapor deposition, [4] ion implantation, [5 -7] and pulsed laser deposition. [8] XPS has been useful in quantifying species, such as carbon or metallic aluminum, [2] that become unintentionally incorporated into the bulk AlN as a result of the particular method of deposition.…”

Section: Introductionmentioning

confidence: 99%

XPS analysis of aluminum nitride films deposited by plasma source molecular beam epitaxy

Rosenberger

Baird

McCullen

et al. 2008

Surface & Interface Analysis

291

161

View full text Add to dashboard Cite

aTen samples of crystalline aluminum nitride (AlN) film were deposited on sapphire and silicon substrates by a plasma source molecular beam method. The samples were analyzed using X-ray photoelectron spectroscopy (XPS) depth profiling and high-resolution X-ray diffraction. Oxygen levels were observed to decrease exponentially from the surface into the bulk film. Aluminum, nitrogen and oxygen peaks were fitted with subpeaks in a consistent manner and the subpeaks were assigned to chemical states. AlN subpeaks were observed at 73.5 eV for Al2p and 396.4 eV for N1s. An N1s subpeak at 395.0 eV was assigned to N-N defects. No direct N-O bonds are assigned; rather it is proposed that an N-Al-O bond sequence is the source of higher binding energy N1s subpeaks. The observations in this study support a model in which oxygen is bound only to aluminum in the form of Al-O octahedral complexes dispersed or clustered throughout the main AlN matrix or as Al-O bonds on the crystal grain boundaries. The data also suggest that the AlN lattice parameters are related to oxygen content, since the c-axis is observed to increase with increasing oxygen content.

show abstract

Section: Introductionmentioning

confidence: 99%

XPS analysis of aluminum nitride films deposited by plasma source molecular beam epitaxy

Rosenberger

Baird

McCullen

et al. 2008

Surface & Interface Analysis

291

161

View full text Add to dashboard Cite

show abstract

“…The FTIR indicated that the tribolayer was hydrated for the room temperature tests. The hydrolysis of AlN occurs by the thermodynamically favourable reaction [21,22]: AlN + 2H2O=AlOOH (amorphous) + NH3.…”

Section: Test At 635 0 Cmentioning

confidence: 99%

Wear and friction of TiAlN/VN coatings against Al2O3 in air at room and elevated temperatures

et al. 2010

View full text Add to dashboard Cite

TiAlN/VN multilayer coatings exhibit excellent dry sliding wear resistance and low friction coefficient, reported to be associated with the formation of self-lubricating V2O5. To investigate this hypothesis, dry sliding ball-on-disc wear tests of TiAlN/VN coatings on flat stainless steel substrates were undertaken against Al2O3 at 25 0 C, 300 0 C and 635 0 C in air. The coating exhibited increased wear rate with temperature. The friction coefficient was 0.53 at 25 0 C, which increased to 1.03 at 300 0 C and decreased to 0.46 at 635 0 C. Detailed investigation of the worn surfaces was undertaken using site-specific transmission electron microscopy (TEM) via focused ion beam (FIB) microscopy, along with Fourier transform infrared (FTIR) and Raman spectroscopy. Microstructure and triboinduced chemical reactions at these temperatures were correlated with the coating's wear and friction behaviour. The friction behaviour at room temperature is attributed to the presence of a thin hydrated tribofilm and the presence of V2O5 at high temperature.

show abstract

“…24 These observations are also in line with other reported results by Krnel and Kosmac. 5,6,24 Since the above characterization techniques (pH measurements, XRD, FT-IR, SEM and TGA/DTA analysis) did not enable to quantitatively estimate the amount of phosphorus adsorbed onto the surface of AlN particles, the four different types of AlN powders were also analyzed by EDAX. However, only the O, Al and P elements were taken into consideration to estimate the P contents, since when nitrogen is considered the amounts of P were hardly detected by the equipment.…”

Section: Characteristics Of Treated Aln Powdermentioning

confidence: 99%

A non-aqueous processing route for phosphate-protection of AlN powder against hydrolysis

Ganesh

Thiyagarajan

Sundararajan

et al. 2008

Journal of the European Ceramic Society

View full text Add to dashboard Cite

Surface chemistry and hydrolysis of a hydrophobic-treated aluminium nitride powder

Cited by 22 publications

References 24 publications

XPS analysis of aluminum nitride films deposited by plasma source molecular beam epitaxy

XPS analysis of aluminum nitride films deposited by plasma source molecular beam epitaxy

Wear and friction of TiAlN/VN coatings against Al2O3 in air at room and elevated temperatures

A non-aqueous processing route for phosphate-protection of AlN powder against hydrolysis

Contact Info

Product

Resources

About