Using pulsed atomic beam technique and a surface ionization ion microscope, the desorption kinetics and the surface diffusion of the alkalis potassium, rubidium and cesium were investigated on a Si(l11)7 x 7-surface at extremely low alkali coverages.In the temperature range 1 120 . . . 800 K, the mean adsorption lifetime 7 ( T ) = 7 0 -exp(E',,,/k T ) and the mean diffusion length X ( T )defined in the equilibrium between adsorption, diffusion and desorptionwere measured. From these data the diffusion constant D ( T ) = D o . exp(-E,,,,/k T) was obtained as D = X'/T. For temperatures T 5 750 K, the diffusion constant was calculated from nonstationary alkali concentration profiles using the Boltzmann-Matano method.From the temperature dependence of these quantities the parameters of desorption (E&, ro) and surface diffusion (Edirr, Do) for K, Rb and Cs on Si(1 11) were obtained. The values of Edifr and Do are comparably high and may be interpreted by non-localized diffusion according to a model proposed by Bonze1 (Surf. Sci. 21 (1970) 45).