Surface Diffusion

Ehrlich, Gert; Stolt, Kaj

doi:10.1146/annurev.pc.31.100180.003131

Cited by 339 publications

(93 citation statements)

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“…are not fixed constants and may depend on the adatom coverage and the adatom-adatom and adatomsubstrate interactions [29,30]. The activation energy for diffusion of metallic atoms on metals is E d ∼ 0.5-1 eV, which is normally a fraction between 1/2 and 1/4 of the adsorption energy E a (typically E a > 1 eV).…”

Section: Spreading Of Materials After Adsorptionmentioning

confidence: 99%

Analysis of the blurring in stencil lithography

et al. 2009

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A quantitative analysis of blurring and its dependence on the stencil-substrate gap and the deposition parameters in stencil lithography, a high resolution shadow mask technique, is presented. The blurring is manifested in two ways: first, the structure directly deposited on the substrate is larger than the stencil aperture due to geometrical factors, and second, a halo of material is formed surrounding the deposited structure, presumably due to surface diffusion. The blurring is studied as a function of the gap using dedicated stencils that allow a controlled variation of the gap. Our results show a linear relationship between the gap and the blurring of the directly deposited structure. In our configuration, with a material source of ∼5 mm and a source-substrate distance of 1 m, we find that a gap size of ∼10 μm enlarges the directly deposited structures by ∼50 nm. The measured halo varies from 0.2 to 3 μm in width depending on the gap, the stencil aperture size and other deposition parameters. We also show that the blurring can be reduced by decreasing the nominal deposition thickness, the deposition rate and the substrate temperature.

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Section: Spreading Of Materials After Adsorptionmentioning

confidence: 99%

Analysis of the blurring in stencil lithography

et al. 2009

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“…which can be related to the surface diffusion coefficient [2], or also known as the surface diffusivity [41],…”

Section: Discussion and Analysismentioning

confidence: 99%

Diffusivity of adatoms on plasma-exposed surfaces determined from the ionization energy approximation and ionic polarizability

Arulsamy¹,

Ostrikov²

2009

Physics Letters A

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Microscopic surface diffusivity theory based on atomic ionization energy concept is developed to explain the variations of the atomic and displacement polarizations with respect to the surface diffusion activation energy of adatoms in the process of self-assembly of quantum dots on plasma-exposed surfaces. These polarizations are derived classically, while the atomic polarization is quantized to obtain the microscopic atomic polarizability. The surface diffusivity equation is derived as a function of the ionization energy. The results of this work can be used to fine-tune the delivery rates of different adatoms onto nanostructure growth surfaces and optimize the low-temperature plasma based nanoscale synthesis processes.

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“…As described in the Section I, long jumps have been observed in the diffusion of surface adsorbates using FIM [7] and STM [19]. In the case of diffusion, the initial ("incident") energy, Ej, is low and consists of a distribution of energies.…”

Section: Application To Transient Surface Mobilitymentioning

confidence: 98%

“…It is motion to and reaction at these sites which are thought to determine many surface reaction rates [ 1,2]. While many measurements have been made of surface diffusion [5][6][7][8], the motion due to adsorbate momentum parallel to the surface upon adsorption or due to exothermic surface processes has received much less attention [9][10][11][12][13][14]. Only a handful of measurements have been made, and the results of these are in apparent…”

Section: Introducionmentioning

confidence: 99%