2021
DOI: 10.1021/acsomega.1c06183
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Surface Dissociation Effect on Phosphonic Acid Self-Assembled Monolayer Formation on ZnO Nanowires

Abstract: Understanding the formation process of self-assembled monolayers (SAMs) of organophosphonic acids on ZnO surfaces is essential to designing their various applications, including solar cells, heterogeneous catalysts, and molecular sensors. Here, we report the significant effect of surface dissociation on SAM formation of organophosphonic acids on single-crystalline ZnO nanowire surfaces using infrared spectroscopy. When employing the most conventional solvent-methanol (relative permittivity ε r … Show more

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Cited by 7 publications
(3 citation statements)
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“…This might result in a non‐uniform, random and dense orientation of Me‐4PACz on the glass part of the ITO substrate. Previously, Nie et al [ 65 ] and Nakamura et al [ 66 ] showed that the use of polar solvents to dissolve SAM results in no SAM layer formation on some oxide surfaces including glass. From this it indicates that the use of polar solvent might be the reason for poor/no assembly of Me‐4PACz SAM on the glass part of the patterned ITO substrate, thus leading to the formation of a dense Me‐4PACz layer and thus, no perovskite layer formation.…”
Section: Resultsmentioning
confidence: 99%
“…This might result in a non‐uniform, random and dense orientation of Me‐4PACz on the glass part of the ITO substrate. Previously, Nie et al [ 65 ] and Nakamura et al [ 66 ] showed that the use of polar solvents to dissolve SAM results in no SAM layer formation on some oxide surfaces including glass. From this it indicates that the use of polar solvent might be the reason for poor/no assembly of Me‐4PACz SAM on the glass part of the patterned ITO substrate, thus leading to the formation of a dense Me‐4PACz layer and thus, no perovskite layer formation.…”
Section: Resultsmentioning
confidence: 99%
“…Phosphonic acids are known to induce superior surface modifications compared to chemisorbed carboxylic acids, particularly when subjected to annealing to maximize the incorporation of P-O bonds into the metal oxide lattice. [6] Better formation of octadecylphosphonic acid (ODPA) SAM on the oxide layer using solvents with lower polarity is reported by Nakamura et al [7] Enhancing device performance can be achieved by molecularlevel interface modification using a self-assembly monolayer. [8] NiO x surface treatment by different types of phenyl-phosphonic acids by dipping the substrates in SAM solution is well explored by Singh et al and they observe an enhancement of the power conversion efficiency (PCE) to 18.45%.…”
Section: Introductionmentioning
confidence: 94%
“…[ 6 ] Better formation of octadecylphosphonic acid (ODPA) SAM on the oxide layer using solvents with lower polarity is reported by Nakamura et al. [ 7 ] Enhancing device performance can be achieved by molecular‐level interface modification using a self‐assembly monolayer. [ 8 ] NiO x surface treatment by different types of phenyl‐phosphonic acids by dipping the substrates in SAM solution is well explored by Singh et al.…”
Section: Introductionmentioning
confidence: 99%