1985
DOI: 10.1103/physrevb.32.6764
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Surface electronic structure of NiO: Defect states,O2andH2O int

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Cited by 154 publications
(50 citation statements)
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“…It is attributed to adsorbed OH species resulting from dissociation of water to form OH+H. The two peaks are due to the 1π and 3σ orbitals of OH as interpreted similarly for OH in NaOH [341] and on other metal-oxides [58,[342][343][344]. We also attribute the features between -5 and -10 eV to adsorbate induced changes in the substrate emission and possibly to emission from the coadsorbed H atom.…”
Section: (I) Electronic Structures Of Adsorbatesmentioning
confidence: 77%
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“…It is attributed to adsorbed OH species resulting from dissociation of water to form OH+H. The two peaks are due to the 1π and 3σ orbitals of OH as interpreted similarly for OH in NaOH [341] and on other metal-oxides [58,[342][343][344]. We also attribute the features between -5 and -10 eV to adsorbate induced changes in the substrate emission and possibly to emission from the coadsorbed H atom.…”
Section: (I) Electronic Structures Of Adsorbatesmentioning
confidence: 77%
“…For this reason, water dissociation on metals is often observed only when O is preadsorbed [58], as was observed first on Pt(111) [351]. On non-polar oxide surfaces, such as CoO(100) [342] and NiO(100) [64,344] dissociative adsorption is found to occur only at defects, whereas the corresponding regular surface areas are inert. Dissociative adsorption was observed on Ti 3+ rich Ar + -bombarded surfaces, such as Ti 2 O 3 (047) [352], TiO 2 (100) [353], SrTiO 3 (100) [354], whereas molecular adsorption was observed on the respective stoichiometric regular surfaces.…”
Section: Discussionmentioning
confidence: 96%
“…4). The reported E f for undoped NiO ranges from 3.8 eV (49) to 5.4 eV (50) and has been found to depend on the deposition substrate (51) and the NiO surface treatment (49). A frequently cited value is 5.0 eV (20,23,44,52) while the valence band maximum (VBM) of undoped NiO is ϳ0.4 eV below E f (Fig.…”
Section: ϫ4mentioning
confidence: 99%
“…Indeed, there is a consensus both from experimental investigations and theoretical calculations that water adsorbs molecularly on NiO(100) surfaces and that a dissociation reaction can only take place at defect sites. [92][93][94][95] Simpson's theoretical calculation by using the semi-empirical SCFMO method MSINDO shows that water dissociation is unlikely on the planar surface of NiO(100) and the associated activation energy for dissociation is high due to the rigidity of the NiO(100) lattice which prevents water molecule from adopting a stable transition state, 96 suggesting by analogy that Ni(bdc)(ted) 0.5 is more stable in water vapor. These conclusions are also supported by considering the metal-oxygen strength from the dissociation energy for diatomic molecules: Zn-O(<250.4 kj/mol), Cu-O(~287.4 kj/mol), Ni-O(~366 kj/mol),Co-O(~397.4 kj/mol).…”
Section: Effects Of Metal Ions On Stability and Reaction Pathwaymentioning
confidence: 99%