Surface Emission of InxGa1-x N/GaN Espaliers Grown by MOCVD under Different Optical Excitation

Abstract

Photoluminescence properties of InGaN film grown on sapphire substrates by metal organic chemical vapor deposition(MOCVD) was experimentally Investigation. The x-ray diffraction(XRD), transmission spectra, PL spectrum were used. The result of XRD shows that the mole composition of In in the InGaN film is estimated be 0.2 approximately. The band gap of the sample is calculated to be 2.66eV. A clear oscillation from F-P cavity could be observed on transmission spectra. There are three main peaks from the surface emission InGaN espaliers being excited on different light sources and different excitation power density. which can be explained the broad PL come from the difference of In composition modulated by was modulated due to F-P cavity arising from surface of sample. . It is found that there is some relationship between the position of the peaks in the PL spectra, the wavelength and intensity of power density and the F-P cavity.PACS: 73.61.