Surface-Enhanced Infrared Absorption on Elongated Nickel Nanostructures

Perry, Donald A.; Borchers, Reece L.; Golden, Jon W.; Owen, Aaron R.; Price, Adam S.; Henry, William; Watanabe, Fumiya; Biris, Alexandru S.

doi:10.1021/jz402092y

Cited by 14 publications

(13 citation statements)

References 23 publications

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“…Randomly distributed metal island fi lms [ 10,11 ] or metal stripe gratings [ 12 ] enable such large-area fabrication, but their plasmonic enhancement is orders of magnitudes smaller than the one of tailored nanoantennas. Ideally, one would like to have low-cost and cm 2 sized chips, which provide plasmonic resonance over the whole area and can be simply put into standard infrared spectrometers, serving as smart substrates for the detection and identifi cation of biological or chemical substances.…”

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confidence: 99%

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

Bagheri

Gießen

Neubrech

2014

Advanced Optical Materials

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and low-cost fabrication is required. Ideally, one would like to have low-cost and cm 2 sized chips, which provide plasmonic resonance over the whole area and can be simply put into standard infrared spectrometers, serving as smart substrates for the detection and identifi cation of biological or chemical substances. Randomly distributed metal island fi lms [ 10,11 ] or metal stripe gratings [ 12 ] enable such large-area fabrication, but their plasmonic enhancement is orders of magnitudes smaller than the one of tailored nanoantennas. In contrast, metal antennas prepared by bottomup approaches, such as nanosphere lithography, [13][14][15] offer higher enhancements but suffer from inhomogeneity on large scales. Recently, colloidal hole mask lithography [ 16,17 ] has been introduced as an approach to fabricate tailored nanostructures that provide high near-fi eld enhancements. However, due to intrinsic limitations of the method, only randomly distributed antennas can be realized. Other methods, like nanoimprint techniques, have their own limitation such as a slow fabrication process of mask. [18][19][20] In contrast laser interference lithography enables a fast preparation of tailored polymer and metal structures arranged in welldefi ned geometries on large scales up to 4 inches, [ 21 ] with a high structure density. [ 22 ] These characteristics make laser interference lithography a powerful tool for the fabrication of plasmonic materials with a broad range of applications, for example, plasmonic color fi ltering [ 23 ] or biosensing. [ 24,25 ] Also, the fabrication of substrates for antenna-assisted SEIRA is enabled by this fl exible approach as we will demonstrate in this paper.In particular, we will highlight the potential of laser interference lithography as a powerful tool for the fast and low-cost preparation of homogeneous large-area substrates for antennaassisted SEIRA. More specifi cally, we utilized laser interference lithography to prepare tailored metal structures featuring highquality plasmon resonances in the near-and mid-infrared spectral range. These substrates provide excellent SEIRA activity as we demonstrate with two different molecular layers attached to the antennas. Furthermore, they enable sensitive in situ monitoring of the UV degradation of polymers via the signal contrast in their vibrational spectra. Laser Interference LithographyThe interference of two coherent laser beams with wavelength λ causes a standing wave grating pattern which can be used Laser interference lithography is utilized to fabricate large-area plasmonic antenna substrates for surface-enhanced infrared absorption (SEIRA). Changing the interference condition in each exposure process allows precise control over the geometrical parameters of the structures and thus tailoring of their optical response. Independent of the underlying wafer, the technique enables a homogeneous preparation of antennas over cm 2 areas with tunable and high-quality plasmonic resonances in the near-and mid-infrared spectral range. The broad applic...

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confidence: 99%

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

Bagheri

Gießen

Neubrech

2014

Advanced Optical Materials

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“…Metals meet the condition that the real part of the dielectric function is larger than the imaginary component [15] like Al [32], Pt [33], Pd [33,34], Ru [33], Rh [33], Sn [13], Ni [35,36], Pb [37] can also be used as SEIRAS substrates. Since the substrates sometimes are used as working electrode, the variety of material choices extremely enriches the applications for ATR-SEIRAS.…”

Section: Prisms and Substrates Used In Atr-seirasmentioning

confidence: 99%

Attenuated Total Reflection Surface-Enhanced Infrared Absorption Spectroscopy: a Powerful Technique for Bioanalysis

Zhang

et al. 2017

J. Anal. Test.

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Attenuated total reflection surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS) has recently been proven to be a powerful tool for bioanalysis. It enables in situ and in real-time observation of dynamic processes occurring on specific interface, revealing rich structural and functional information of biomolecules at sub monolayer level. The aim of this general review was to give an overview of the cutting edge applications of ATR-SEIRAS. We start with description of the basic configuration of the standard ATR-SEIRAS platform. The enhanced mechanisms and methods to fabricate enhanced substrates are then presented. We discuss the recent developments, challenges and applications of ATR-SEIRAS in bioanalysis, mainly focusing on DNA analysis, protein behavior and cell properties. Finally, further development of the ATR-SEIRAS technique with enhanced sensitivity, improved time and spatial resolutions will be prospected.

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“…The best SEIRA enhancement factors reported to date on Cu nanostructures (CuNSs) are x12-25 in an electrochemical environment to control potential Cu oxidation [4]. It is now common the use SERS and SEIRA together to study layer by layer growth of thin films adsorbed in proximity to metal nanostructures [19][20][21][22][23][24][25][26][27][28][29][30][31]. Such a long-range effect in SEIRA experiments brings into question the role of Cu oxidation in suppressing SEIRA in adsorbed organic or biological layers on CuNSs.…”

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“…33 Here we will show that CuNSs grown in vacuum at an oblique deposition angle with respect to the metal source are superior to conventional CuNSs formed at a normal deposition angle (no substrate tilt with respect to the metal source). Application of oblique-angle deposition (OAD) has led to improved SEIRA substrates for Ag and Ni nanostructures [19,25,34]. SEIRA grazing angle are more uniform in size and spacing because of the "shadowing effect" resulting from OAD [19,25,32].…”

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confidence: 99%

“…Application of oblique-angle deposition (OAD) has led to improved SEIRA substrates for Ag and Ni nanostructures [19,25,34]. SEIRA grazing angle are more uniform in size and spacing because of the "shadowing effect" resulting from OAD [19,25,32]. As a secondary effect, the lower Cu exposure to the CaF 2 during OAD might also allow more time for the CuNSs to form and account for more Cu being evaporated using OAD to obtain CuNSs.…”

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confidence: 99%

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Surface-enhanced infrared absorption studies of copper nanostructures formed by oblique-angle deposition

Henry

Biris

Watanabe

et al. 2016

Chemical Physics Letters

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It is demonstrated that Cu nanostructures fashioned by oblique angle deposition (OAD) of gaseous Cu atoms onto CaF 2 substrates have SEIRA enhancement factors that are close to par with Ag or Au nanostructures formed using vapor deposition at a normal deposition angle. Cu nanostructures grown at normal angle show about x5 in SEIRA enhancement of a pnitrobenzoic acid (PNBA) monolayer and have a range of over 100 nm in particle size. Conversely, Cu nanostructures deposited by OAD show SEIRA enhancement of approximately x40 and are more uniform with approximate circular shapes averaging 25 nm and spacing less than 10 nm.

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Surface-Enhanced Infrared Absorption on Elongated Nickel Nanostructures

Cited by 14 publications

References 23 publications

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

Attenuated Total Reflection Surface-Enhanced Infrared Absorption Spectroscopy: a Powerful Technique for Bioanalysis

Surface-enhanced infrared absorption studies of copper nanostructures formed by oblique-angle deposition

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