Surface Finishing and Evaluation of Three-Dimensional Silicon Microchannel Using Magnetorheological Fluid

Kim, Wook Bae; Lee, Seung Hwan; Min, Byung Kwon

doi:10.1115/1.1811113

Cited by 73 publications

(21 citation statements)

References 21 publications

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“…This is accomplished through fine control of the magnetic field, which affects the force acting on the magnetic particles and determines the motion of the magnetic particles against the workpiece [8][9][10][11][12]. As typified by magneto-rheological fluid (MRF) polishing, magnetic field-assisted finishing has become widely used for ultraprecision finishing of optical components [13].…”

Section: Introductionmentioning

confidence: 99%

Study of Finishing of Wafers by Magnetic Field-Assisted Finishing

Yamaguchi

Yumoto

Shinmura

et al. 2009

JAMDSM

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The aims of this paper are to propose a new finishing process and show the feasibility of ultra-precision finishing of thin quartz wafers used for high-frequency devices. This particular application requires simultaneous improvement of surface roughness and thickness variation with minimal material removal. Consequently, the process must allow for the control of both super-fine finishing and localized material removal. This paper proposes a method using magnetic field-assisted finishing for the finishing of thin quartz wafers. The magnetic field-assisted finishing process enables localized material removal through control of the magnetic field distribution at the finishing area; and mirror finishing is achieved using magneto-rheological fluid-based slurry. This paper describes the processing principle, the development of the finishing equipment, and the required conditions to realize the principle. The finishing experiments demonstrate the feasibility of the proposed method to perform super-fine finishing of 60 µm thick quartz wafers, in which the control of the magnetic field allows for localization of the material removal to improve or maintain the thickness variation, as desired.

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Section: Introductionmentioning

confidence: 99%

Study of Finishing of Wafers by Magnetic Field-Assisted Finishing

Yamaguchi

Yumoto

Shinmura

et al. 2009

JAMDSM

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“…A disk-shaped permanent magnet is employed. For the sake of the gravity and the magnetic levitation force [16] , majority of abrasive particles within the MCF slurry move down towards the work surface. In addition, all of the clusters are collected forcibly by the magnetic attraction force and gathered in the area where the magnetic field is stronger.…”

Section: Polishing Principle and Experimental Rigmentioning

confidence: 99%

Nano-precision Polishing of CVD SiC Using MCF (Magnetic Compound Fluid) Slurry

Wu¹,

Wang²,

Fujimoto³

et al. 2014

Journal of The Korean Society of Manufacturing Technology Engin

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Article history:CVD SiC is a perfect material used for molds/dies in hot press molding of glass lens. In its fabrication process, nano-precision polishing is essential finally. For this purpose, a novel polishing method using MCF (Magnetic Compound Fluid) slurry is proposed. In this method, MCF slurry is supplied into a given gap between the workpiece and a MCF slurry carrier, and constrained within the polishing zone by magnetic forces from permanent magnet. In this paper, after an experimental rig used to actually realize the proposed method has been constructed, the fundamental polishing characteristics of CVD SiC such as the effects of process parameters including MCF slurry composition on worksurface roughness were experimentally investigated. As a result, nano-precision surface finish of CVD SiC was successfully attained with MCF slurry and the optimum process parameters for obtaining the smoothest work-surface were determined.

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“…Pioneering studies regarding the mechanisms of glass removal using MR finishing can be found in [7][8][9]. Kim et al [10] performed preliminary experiments for the finishing of silicon-based structures with a group of micro-sized straight channels and obtained an optimized recipe together with the associated experimental conditions. During the MR finishing, the average channel height decreases by 2-3 mm with slight rounding at edges (or corners) formed inevitably.…”

Section: Introductionmentioning

confidence: 99%