Surface hydroxylation and local structure of NiO thin films formed on Ni(111)

Kitakatsu, N.; Maurice, Vincent; Hinnen, C.; Marcus, Philippe

doi:10.1016/s0039-6028(98)00089-2

Cited by 179 publications

(140 citation statements)

References 44 publications

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“…Below 470 K, only NiO(111) formation has been observed, 5,9,10,32 while NiO(001) islands have been found for more elevated temperatures.…”

Section: Resultsmentioning

confidence: 99%

“…34 Since the NiO(111) films were experimentally determined to be very thin, i. e., only a few atomic layers thick, a metastable character of the NiO(111) orientation has been postulated, in agreement with the growth of the thermodynamically stable, unpolar NiO(001) face at 500 K, i. e., at sufficiently high temperature. 33 In other studies, the stability of the NiO(111)-(1×1) surface has been related to the adsorption of hydroxyl species 32,35 that prevent the surface from undergoing a so-called "octopolar" (2×2) reconstruction leading to a compensation of the surface dipole.…”

Section: Resultsmentioning

confidence: 99%

“…Since hydroxyl species are easily removed by annealing to 600 K, 35 this scenario would provide an alternative explanation for the stability of the (1×1) phase at room temperature and the preferential growth of NiO(001) above 500 K. 32 Yet, it has still remained unclear whether the driving force for the (2×2) reconstruction at high temperature would be the same for thin 38 as well as moderately thick NiO(111) films-a question raised almost twenty years ago.…”

Section: 37mentioning

confidence: 99%

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Self-limited oxide formation in Ni(111) oxidation

et al. 2011

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The oxidation of the Ni(111) surface is studied experimentally with low energy electron microscopy and theoretically by calculating the electron reflectivity for realistic models of the NiO/Ni(111) surface with an ab initio scattering theory. Oxygen exposure at 300 K under ultrahigh-vacuum conditions leads to the formation of a continuous NiO(111)-like film consisting of nanosized domains. At 750 K, we observe the formation of a nano-heterogeneous film composed primarily of NiO (111) surface oxide nuclei, which exhibit virtually the same energy-dependent reflectivity as in the case of 300 K and which are separated by oxygen-free Ni(111) terraces. The scattering theory explains the observed normal incidence reflectivity R(E) of both the clean and the oxidized Ni(111) surface. At low energies R(E) of the oxidized surface is determined by a forbidden gap in the k = 0 projected energy spectrum of the bulk NiO crystal. However, for both low and high temperature oxidation a rapid decrease of the reflectivity in approaching zero kinetic energy is experimentally observed. This feature is shown to characterize the thickness of the oxide layer, suggesting an average oxide thickness of two NiO layers.

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“…Below 470 K, only NiO(111) formation has been observed, 5,9,10,32 while NiO(001) islands have been found for more elevated temperatures.…”

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: 37mentioning

confidence: 99%

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Self-limited oxide formation in Ni(111) oxidation

et al. 2011

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“…For this reason, as a solvent in most cases the distilled water is used [11]. In aqueous media, nickel powder can undergo hydroxylation and the thin nickel oxide layer present on its surface can be converted to Ni(OH) 2 or NiO(OH) [12]. In the case of the application of metallic powder with micrometric size, the amount of formed compounds is minimal and should be reduced during the sintering process.…”

Section: Introductionmentioning

confidence: 99%

Al2O3/Ni functionally graded materials (FGM) obtained by centrifugal-slip casting method

Zygmuntowicz

Wiecińska

Miazga

et al. 2017

J Therm Anal Calorim

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The fabrication and the characterization of Al 2 O 3 /Ni composites with a gradient distribution of the Ni particles are reported. The composites have been obtained by centrifugal-slip casting and subsequent sintering and had the shape of a hollow cylinder. TG/DTA analysis was done for the nickel powder with the addition of the dispersant used in centrifugal-slip casting as well as for the composite green body. The measurements were performed in two atmospheres: argon and the mixture of argon and hydrogen (1:1). Additionally, coupling the thermobalance with the mass spectrometer allowed to determine type of gases released from the samples during thermal treatment. The morphology and chemical composition of the produced composites were analyzed using a scanning electron microscope equipped with an EDS detector. Interface between alumina and nickel was described. Moreover, the X-ray diffraction was made. The stereological analysis confirmed that the nickel particles are distributed in the composite in a gradient way.

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“…4,10 In aqueous solutions, Ni develops a thin passive film with a duplex structure consisting of a protective, crystalline, dense, inner NiO layer, and an amorphous, porous, outer Ni(OH) 2 layer. 4,9,[11][12][13][14][15][16][17] The thickness of the inner NiO layer, measured using different ex-situ and in-situ techniques was reported to vary from a few angstroms to tens of angstroms. 3,[18][19][20][21] At the film/electrolyte interface, the dissolution of NiO from the passive film is not significant.…”

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confidence: 99%

Polarized Neutron Reflectometry of Metal Consumption and Passive Film Growth on Nickel Exposed to an Alkaline Deuterium Oxide (D₂O) Solution

Fritzsche

Burton

et al. 2017

J. Electrochem. Soc.

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Electrochemical behavior of Ni in an alkaline heavy water electrolyte was studied using cyclic voltammetry and polarized neutron reflectometry. Delays in the hydrogen and oxygen evolution reactions on Ni electrodes and slower kinetics of the reactions in heavy water compared to light water were observed. However, in both 0.01 mol/L NaOH light and heavy water solutions, Ni oxidation and passive film formation occurred at the same potential with similar passive current densities indicating a minor isotope effect of deuterium on passive film formation and growth. Polarized neutron reflectometry detected a passive film growth coefficient of 11.5 ± 1.1 Å/V. The Ni consumption coefficient was determined to be 7.3 ± 1.5 Å/V. Ni oxidation and passive film growth occurred mostly during the transient period after the applied potential increase but was negligible at the steady state. The electric field strength across the passive film was 8 × 10 6 V/cm. The Pilling-Bedworth ratio of the passive film during potentiostatic growth was close to the value of NiO grown on bulk Ni. This work demonstrated the capability of neutron reflectometry in the study of passive films on metals and alloys.

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Surface hydroxylation and local structure of NiO thin films formed on Ni(111)

Cited by 179 publications

References 44 publications

Self-limited oxide formation in Ni(111) oxidation

Self-limited oxide formation in Ni(111) oxidation

Al2O3/Ni functionally graded materials (FGM) obtained by centrifugal-slip casting method

Polarized Neutron Reflectometry of Metal Consumption and Passive Film Growth on Nickel Exposed to an Alkaline Deuterium Oxide (D₂O) Solution

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Surface hydroxylation and local structure of NiO thin films formed on Ni(111)

Cited by 179 publications

References 44 publications

Self-limited oxide formation in Ni(111) oxidation

Self-limited oxide formation in Ni(111) oxidation

Al2O3/Ni functionally graded materials (FGM) obtained by centrifugal-slip casting method

Polarized Neutron Reflectometry of Metal Consumption and Passive Film Growth on Nickel Exposed to an Alkaline Deuterium Oxide (D2O) Solution

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Product

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Polarized Neutron Reflectometry of Metal Consumption and Passive Film Growth on Nickel Exposed to an Alkaline Deuterium Oxide (D₂O) Solution