1990
DOI: 10.1021/ic00347a008
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Surface-mediated synthesis of H4M4(CO)12 (M = ruthenium, osmium) on hydroxylated silica

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Cited by 37 publications
(24 citation statements)
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“…Synthesis of [H 4 Os 4 (CO) 12 ]. The cluster [H 4 Os 4 (CO) 12 ] may be synthesized in good yields by reaction of silica-supported [Os 3 (CO) 12 ] with H 2 (1 atm) at 100−150 °C . Here we report improved silica-mediated syntheses using a more convenient starting material such as α-[Os(CO) 3 Cl 2 ] 2 or OsCl 3 .…”
Section: Resultsmentioning
confidence: 99%
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“…Synthesis of [H 4 Os 4 (CO) 12 ]. The cluster [H 4 Os 4 (CO) 12 ] may be synthesized in good yields by reaction of silica-supported [Os 3 (CO) 12 ] with H 2 (1 atm) at 100−150 °C . Here we report improved silica-mediated syntheses using a more convenient starting material such as α-[Os(CO) 3 Cl 2 ] 2 or OsCl 3 .…”
Section: Resultsmentioning
confidence: 99%
“…The purity of [Os 3 (CO) 12 ] was controlled by thin-layer chromatography, mass spectroscopy, and infrared spectroscopy . The polynuclear hydrides obtained as impurities were identified by their infrared (in CH 2 Cl 2 ) and 1 H NMR (in CDCl 3 ) spectra. , Further extraction of the remaining silica powder with acetonitrile afforded traces of Na 2 [Os 10 C(CO) 24 ], characterized by its infrared spectrum in CH 3 CN …”
Section: Methodsmentioning
confidence: 99%
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“…A few years ago, some of us reported the easy and high-yield synthesis of [H 4 Os 4 (CO) 12 ] by hydrogenation under 1 atm of H 2 of silica-supported [Os 3 (CO) 12 ] was later explained by us by the formation of silica-anchored [HOs 3 (CO) 10 (OSi⋮)] as reactive intermediate.…”
Section: Introductionmentioning
confidence: 99%
“…The catalytically active cluster was a complex entity. During thermal activation, not only was a small proportion of the carbonyl ligands lost, evolved as gaseous CO, but a further small proportion underwent reaction generating carbon dioxide and leaving ligand-C associated with the catalyst (Boudouard reaction) [3,6,9,[12][13][14].…”
Section: Introductionmentioning
confidence: 99%