Surface Modification of Poly(aryl ether ether ketone) by Pulsed Oxygen Plasma

Abstract

To minimize degradation reactions occurring at the same time as surface modification reactions, the surface modification of poly(aryl ether ether ketone) (PEEK) film surfaces by pulsed oxygen plasma was investigated. Oxygen radicals and ion and electron concentrations in the oxygen plasma were calculated as a function of the elapsed time after the discharge was turned off. The pulsed plasmas showed a low contact angle compared to those treated with continuous plasma, though the weight loss of the pulsed plasma irradiated sample decreased compared to those irradiated by continuous plasma. X-ray photoelectron spectra (XPS) measurements indicated that oxygen groups were formed on the PEEK surface.

Development of Oxidized Sulfur Polymer Films through a Combination of Plasma Polymerization and Oxidative Plasma Treatment

“…These unstable radicals become oxidized into more stable groups as they react with oxygen radicals generated in the plasma environment . As reported in the literature, − radicals play a more significant role than ions in the activation/oxidation process because of their faster recombination. For oxygen-plasma-treated samples, increasing the treatment time beyond 30 min resulted in an abrupt increase in the concentration of total oxidized moieties from 43% to more than 95%.…”

Plasma Surface Modification of Poly(aryl ether ether ketone) and Surface Metallization using Copper Metal

“…The C1s spectrum for the PEEK film can be resolved into three main components at 285.0 eV (C-H groups), 286.4 eV (C-O groups) and 287.4 eV (C=O groups) [10,13]. Table 2 shows the O/C atomic ratio for the PEEK film and relative intensities of C1s chemical components treated with pulsed oxygen plasma and conventional oxygen plasma.…”

“…2.2 ; Wolfram Research, Inc.) was used for these calculations. Computational details, such as assumptions used for the calculations are described in our earlier report [13].…”

“…and offtime (plasma power is not supplied.). [10,13]. A previous report [13] provides the relevant details.…”

“…Consequently, PEEK was desirable for the investigation of the etching action on polymeric surfaces by electrons and ions in plasma. Details of this material are given in a previously report [10,13].…”