Surface Modification of SnO2 Photoelectrodes in Dye-Sensitized Solar Cells: Significant Improvements in Photovoltage via Al2O3 Atomic Layer Deposition

Prasittichai, Chaiya; Hupp, Joseph T.

doi:10.1021/jz100361f

Cited by 229 publications

(230 citation statements)

References 32 publications

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“…These observations are in line with several reports highlighting the role of the surface localized states in the faster recombination rates in dye-sensitized solar cells made of nanoparticulate films of SnO 2 as compared to those made of TiO 2 . [16][17][18] In the present work, we moreover demonstrate that the α value is independent of the pH, a result which indicates that the low-energy surface states distribution follow the same pH-dependence as for the conduction band potential.…”

Section: Acs Paragon Plus Environmentsupporting

confidence: 73%

Investigating Charge Transfer in Functionalized Mesoporous EISA–SnO₂ Films

et al. 2017

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Semiconductive transparent thin films of periodically organized nanostructured SnO2 were prepared on flat conductive ITO substrates by evaporation-induced self-assembly (EISA) under different dip-coating regimes and then functionalized by two redox-active chromophores, i.e., the flavin mononucleotide (FMN) able to reversibly exchange 2 e– and 2 H+ and the [OsII(bpy)2(4,4′-CH2PO3H2-bpy)]2+ complex (OsP) involving a fast and reversible one-electron transfer. The redox behavior of these two chemisorbed chromophores was investigated by cyclic voltammetry and cyclic voltabsorptometry. On account of the distinct formal potential of the two redox chromophores relative to the position of the lower conduction band edge of SnO2, the heterogeneous electron transfer was observed to be either reversible (FMN) or irreversible (OsP). In the case of the OsP-functionalized SnO2 electrode, quantitative analysis of the cyclic voltabsorptograms was achieved within the framework of our previously proposed kinetic model of charge transfer/transport in mesoporous semiconductive films (Phys. Chem. Chem. Phys.20151710592), allowing for direct comparison between EISA–TiO2 and EISA–SnO2 electrodes. It is notably shown that the interfacial electron transfer between the adsorbed redox chromophore and the SnO2 interface is the rate-determining process under our experimental conditions. It is additionally demonstrated that the electrons trapped in the low-energy surface states of EISA–SnO2 can directly participate in the interfacial electron transfer, a behavior that strongly contrasts that which we had previously found at EISA–TiO2 electrodes (i.e., wherein only electrons from the conduction band were involved in the interfacial electron transfer).

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Section: Acs Paragon Plus Environmentsupporting

confidence: 73%

Investigating Charge Transfer in Functionalized Mesoporous EISA–SnO₂ Films

et al. 2017

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“…However, a large decrease in short-circuit current density was also observed due to the large energy barrier to charge transport introduced by the Al 2 O 3 layer, which reduced the overall energy conversion efficiency. Similarly, decreased current density was observed by Prasittichai et al 74 when Al 2 O 3 was deposited with multiple ALD cycles on the SnO 2 photoanode in a DSSC cell. However, as shown in Fig.…”

Section: B Surface Passivation By Ald To Minimize Charge Recombinationsupporting

confidence: 66%

“…However, as shown in Fig. 5(c), one cycle of Al 2 O 3 ALD passivated the SnO 2 photoelectrode and caused a slightly increased short circuit current density as well as approximately a two-fold increase in the open circuit photovoltage, 74 corresponding to an increased efficiency from 0.76 to 3.7 %. The authors ascribed this improvement to the passivation of surface states that existed in the SnO 2 by submonolayer ALD Al 2 O 3 ( < 1.5 Å ) deposited in a single cycle.…”

Section: B Surface Passivation By Ald To Minimize Charge Recombinationmentioning

confidence: 89%

Atomic layer deposition for electrochemical energy generation and storage systems

Peng

Lewis

Hoertz

et al. 2011

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Clean renewable energy sources (e.g., solar, wind, and hydro) offers the most promising solution to energy and environmental sustainability. On the other hand, owing to the spatial and temporal variations of renewable energy sources, and transportation and mobility needs, high density energy storage and efficient energy distribution to points of use is also critical. Moreover, it is challenging to scale up those processes in a cost-effective way. Electrochemical processes, including photoelectrochemical devices, batteries, fuel cells, super capacitors, and others, have shown promise for addressing many of the abovementioned challenges. Materials with designer properties, especially the interfacial properties, play critical role for the performance of those devices. Atomic layer deposition is capable of precise engineering material properties on atomic scale. In this review, we focus on the current state of knowledge of the applications, perspective and challenges of atomic layer deposition process on the electrochemical energy generation and storage devices and processes.

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“…48 In the area of photovoltaics, dye sensitized solar cells (DSCs) offer the potential for low-cost solar power using earth-abundant materials, but to date, the relatively low conversion efficiencies of DSCs have limited their adoption. ALD has yielded promising results by allowing the introduction of ultrathin transparent conducting films, 49 dye adhesion layers, 50 and barrier films 51 into the DSC structure that could be combined with improved electrolytes and sensitizers to make a highly efficient DSC suitable for low cost mass production. Finally, one of the early applications for ALD technology, heterogeneous catalyst synthesis, has lately gained renewed interest with the advent of ALD methods to fabricate and stabilize metal catalysts with exquisite control over the nanoparticle size, composition, and structure.…”

Section: E Ald For Energy Applicationsmentioning

confidence: 99%

History of atomic layer deposition and its relationship with the American Vacuum Society

Parsons¹,

Elam²,

George³

et al. 2013

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. This article explores the history of atomic layer deposition (ALD) and its relationship with the American Vacuum Society (AVS). The authors describe the origin and history of ALD science in the 1960s and 1970s. They also report on how the science and technology of ALD progressed through the 1990s and 2000s and continues today. This article focuses on how ALD developed within the AVS and continues to evolve through interactions made possible by the AVS, in particular, the annual International AVS ALD Conference. This conference benefits students, academics, researchers, and industry practitioners alike who seek to understand the fundamentals of self-limiting, alternating binary surface reactions, and how they can be applied to form functional (and sometimes profitable) thin film materials. The flexible structure of the AVS allowed the AVS to quickly organize the ALD community and create a primary conference home. Many new research areas have grown out of the original concepts of "Atomic Layer Epitaxy" and "Molecular Layering," and some of them are described in this article. The people and research in the ALD field continue to evolve, and the AVS ALD Conference is a primary example of how the AVS can help a field expand and flourish.

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Surface Modification of SnO₂ Photoelectrodes in Dye-Sensitized Solar Cells: Significant Improvements in Photovoltage via Al₂O₃ Atomic Layer Deposition

Cited by 229 publications

References 32 publications

Investigating Charge Transfer in Functionalized Mesoporous EISA–SnO₂ Films

Investigating Charge Transfer in Functionalized Mesoporous EISA–SnO₂ Films

Atomic layer deposition for electrochemical energy generation and storage systems

History of atomic layer deposition and its relationship with the American Vacuum Society

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Surface Modification of SnO2 Photoelectrodes in Dye-Sensitized Solar Cells: Significant Improvements in Photovoltage via Al2O3 Atomic Layer Deposition

Cited by 229 publications

References 32 publications

Investigating Charge Transfer in Functionalized Mesoporous EISA–SnO2 Films

Investigating Charge Transfer in Functionalized Mesoporous EISA–SnO2 Films

Atomic layer deposition for electrochemical energy generation and storage systems

History of atomic layer deposition and its relationship with the American Vacuum Society

Contact Info

Product

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Surface Modification of SnO₂ Photoelectrodes in Dye-Sensitized Solar Cells: Significant Improvements in Photovoltage via Al₂O₃ Atomic Layer Deposition

Investigating Charge Transfer in Functionalized Mesoporous EISA–SnO₂ Films

Investigating Charge Transfer in Functionalized Mesoporous EISA–SnO₂ Films