Surface modification studies of Kapton^® HN polyimide films

Abstract

Surface imide hydrolysis of Kapton HN polyimide films in a 1 M KOH aqueous solution was studied using dynamic contact angle measurements, X‐ray photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (TOF‐SIMS). The surface energy of Kapton HN increased quickly upon KOH treatment due to the formation of polar polyamate. Prolonged treatment led to a jump in surface energy that we ascribe to the onset of etching causing increased surface roughness. Potassium depth profiles of treated Kapton HN samples measured by XPS and TOF‐SIMS demonstrated that during the first 10 minutes of 1 M KOH treatment the modification depth increased rapidly. Thereafter the thickness of the modified layer no longer increased. For Kapton H films, however, the development of etching was much slower and a steady increase in modification depth was observed even after long treatment times. The different behaviours between Kapton HN and Kapton H films in alkali solutions are analysed and discussed. Copyright © 2003 Society of Chemical Industry

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