Surface Nitriding of Al-Mg Alloys Using a Rotary Barrel Tank

Zhou, Tao; Yoshida, Minoru; Okumiya, Masahiro; Utsumi, Noah; Tsunekawa, Yoshiki

doi:10.4028/www.scientific.net/kem.523-524.1080

Cited by 2 publications

(3 citation statements)

References 13 publications

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“…In a previous report, nitriding was conducted using Al-50 mass% Mg in activation powders. 7) The result in Fig. 7 denoted the same tendency as the previous results, and the film was considered to be adhered to the top of the substrate surface.…”

Section: Resultssupporting

confidence: 60%

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Formation of Aluminum Nitride Films by Gas Nitriding

Yoshida

Zhou

Utsumi

2014

KEM

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In this study, aluminum alloys were subjected to nitriding at 823 K for 0–18.0 ks using alumina and magnesium powders for improving their radiation performance. After nitriding, aluminum nitride films were formed on the aluminum substrate. The thickness of the formed films varied from 1.5 to 11 μm, and the color of the film surface was dark brown or black. The thickness of the aluminum nitride film increased with an increase in the treatment time. X-ray diffraction and electron probe microanalysis results showed that the film was composed of aluminum nitride, alumina, aluminum, and magnesium. Further, the film showed good adhesion at 0 ks.

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Section: Resultssupporting

confidence: 60%

“…A barrel tank was used for surface nitriding of aluminum substrates. Details of the nitriding system have been reported previously 6,7) . The barrel tank used in this study was octagonal, as shown in Fig.…”

Section: Methodsmentioning

confidence: 99%

Formation of Aluminum Nitride Films by Gas Nitriding

Yoshida

Zhou

Utsumi

2014

KEM

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“…A barrel tank, as shown in Figure 2, was used to nitride the surfaces of aluminum substrates. Details of the nitriding system have been reported previously 10,11) . An octagonal barrel tank was used in this study.…”

Section: Methodsmentioning

confidence: 99%

Surface Structure and Emissivity of Aluminum Nitride Films

Yoshida

Utsumi

Ichiki

et al. 2015

AMR

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In this study, aluminum nitride films were formed on aluminum substrates by gas nitriding in order to improve their low emissivities. To accomplish this, aluminum alloys were subjected to nitriding conditions at 773 and 823 K for 0–5 h, using alumina and magnesium powders. The resulting aluminum nitride films were several micrometers thick and the films were dark brown or black. The surface structures of the aluminum nitride films were investigated using a scanning electron microscope, which showed fine acicular aluminum nitride nodules with diameters on the order of several micrometers. Emissivities were evaluated at 298 K using Fourier transform infrared spectroscopy, in a wavelength range of 2–14 μm. Total emissivities at temperatures between 323 and 383 K were estimated from emissivity results obtained at 298 K. It was subsequently found that emissivity decreases with increasing wavelength and an emissivity of 0.80 was observed at a wavelength of 2 μm. Total emissivity was 0.49 % at 298 K and was in excess of 0.50 between 323 and 383 K.

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Surface Nitriding of Al-Mg Alloys Using a Rotary Barrel Tank

Cited by 2 publications

References 13 publications

Formation of Aluminum Nitride Films by Gas Nitriding

Formation of Aluminum Nitride Films by Gas Nitriding

Surface Structure and Emissivity of Aluminum Nitride Films

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