Surface nitriding of graphite substrate by plasma focus device towards synthesis of carbon nitride coating

Nayak, B.B.; Acharya, B. S.; Mohanty, S. R.; Borthakur, T. K.; Bhuyan, H.

doi:10.1016/s0257-8972(01)01285-3

Cited by 56 publications

(41 citation statements)

References 34 publications

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“…Synthesis of nano-crystalline multiphase, zirconium aluminium oxynitride (ZrAlON) composite films is accomplished by using a Mather type DPF device [19,20], powered by a single Maxwell 32 mF, 15 kV; fast discharging capacitor with maximum storage energy of 3.3 kJ. It is a conventional device, used as a source of energetic nitrogen ions for the surface modification of materials (zirconium) and plays a key role to deposit composite film on zirconium substrate by ablation of anode material (aluminium) by relativistic electrons.…”

Section: Methodsmentioning

confidence: 99%

Synthesis of nano-crystalline zirconium aluminium oxynitride (ZrAlON) composite films by dense plasma Focus device

Khan

Hassan

Hussain

et al. 2009

Applied Surface Science

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Section: Methodsmentioning

confidence: 99%

Synthesis of nano-crystalline zirconium aluminium oxynitride (ZrAlON) composite films by dense plasma Focus device

Khan

Hassan

Hussain

et al. 2009

Applied Surface Science

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“…The deposition of P-ZrON composite films on Zr substrates is accomplished by employing Mather type PF device [44,45]. In present experiment, the PF device is charged to 14 kV with the bank energy of 2.94 kJ.…”

Section: Methodsmentioning

confidence: 99%

“…The inductance, quarter time period, short-circuit peak discharge current and characteristic impedance are 110 nH, *3 ls, 170 kA and 60 mX respectively. More details of PF facilities are provided elsewhere [44][45][46][47]. The schematic diagram of PF device is shown in Fig.…”

Section: Methodsmentioning

confidence: 99%

Role of Nitrogen Pressure on the Structural and Mechanical Properties of ZrON Composite Films Deposited by Plasma Focus Device

et al. 2015

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Polycrystalline zirconium oxy-nitride (P-ZrON) composite films are deposited on Zr substrates by plasma focus device. The focusing efficiency of plasma focus is maximum at 1.5 mbar nitrogen pressure (NP) due to more intense signal of high voltage probe. The P-ZrON composite films are deposited for 25 focus shots at different NP. The XRD patterns confirm the evolution of ZrN (111), Zr 3 N 4 (230), Zr 3 N 4 (320), Zr 3 N 4 (140), Zr 3 N 4 (340) and ZrO 2 (200) diffraction planes. The peak intensity of different diffraction planes and their broadening are associated with increasing NP. The (N ? O)/Zr atomic ratio's are found to be 0.78, 0.88, 1.31, 0.66 and 0.55 at 0.5, 1.0, 1.5, 2.0 and 2.5 mbar NP respectively. The variation in crystallite size of different planes and strain transformation observed in various planes are attributed to varying ion energy fluxes which are associated with the increase of NP. The lattice parameter of ZrN is found to be 0.461 nm at 0.5 mbar NP which is decreased to 0.457 nm at 1.5 mbar NP. The weight fractions of ZrN, Zr 3 N 4 and ZrO 2 phases deposited at 2.5, 2 and 1.5 mbar NP are found to 30.5, 28.5 and 41 % respectively. The SEM microstructures reveal that the size and shape of nano-particles and the formation of complicated network of nano-wires (diameter = * 55 nm) and nano-combs are associated with increasing NP. The AFM images show the maximum rms surface roughness of P-ZrON composite film when deposited at 1.5 mbar NP. The micro-hardness (8623 ± 0.95 MPa) of P-ZrON composite film deposited at 1.5 mbar NP is found to be four times the micro-hardness of virgin Zr.

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“…[1][2][3][4][5][6] The uniqueness of the source is that such a simple and cost effective device produces the pulsed polyenergetic ion beams with highly charged states and fluence. 7 Basically, the ion beam is generated from the magnetically compressed plasma column of the PF device along with the other radiations such as x rays and electron beams.…”

Section: Introductionmentioning

confidence: 99%

Temporal and spatial study of neon ion emission from a plasma focus device

Bhuyan¹,

Neog²,

Mohanty³

et al. 2011

Physics of Plasmas

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The temporal and spatial characteristics of the neon ion beam emissions from a low energy plasma focus device have been studied by employing a multiple Faraday cup assembly and the CR-39 track detectors at different angular and axial positions. In addition, the operating gas pressures were also varied to study the temporal and spatial characteristics of the neon ion beam emissions. The Faraday cup analyses show that the ion flux strongly depends on the operating gas pressure as well as the angular positions. The estimated ion energy measurements at the aperture of the Faraday cup indicate that the plasma focus device is a source of polyenergetic ions ranging from approximately a few keV to a few hundreds of keV, irrespective of the angular positions. The exposed CR-39 detectors have shown the formation of multiple ion tracks with diameter ranging from 2 to 13 m. The populations of lower diameter tracks ͑2-6 m͒ are observed to be more at 0°and 10°angles. It is also noticed that the most populated track counts have shifted toward the higher diameter as the angular positions change from 0°to 70°. The present study enables us to predict a clear picture of ion flux and energy distribution inside the plasma focus chamber that will help to use the device for material irradiation application in a more controlled manner.

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Surface nitriding of graphite substrate by plasma focus device towards synthesis of carbon nitride coating

Cited by 56 publications

References 34 publications

Synthesis of nano-crystalline zirconium aluminium oxynitride (ZrAlON) composite films by dense plasma Focus device

Synthesis of nano-crystalline zirconium aluminium oxynitride (ZrAlON) composite films by dense plasma Focus device

Role of Nitrogen Pressure on the Structural and Mechanical Properties of ZrON Composite Films Deposited by Plasma Focus Device

Temporal and spatial study of neon ion emission from a plasma focus device

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