Surface Optimization of Commercial Porous Ti Substrates by EPD of Titanium Nitride

Abstract

In this work, the infiltration of TiN powders by electrophoretic deposition (EPD) in aqueous media was considered as alternative method to reduce the size craters and the roughness of commercial porous Ti substrates. Ti substrates can be used as suitable supports for the deposition of dense hydrogen separation TiNx-based membranes by physical vapor deposition (PVD) techniques. The influence of various EPD deposition parameters on surface morphology and roughness of TiN-infiltrated substrates were investigated in order to optimize their surface properties. The results suggest that a multi-step EPD procedure is an effective technique for reducing substrate surface defects of commercial porous Ti substrates which could then be successfully used as proper supports for the deposition of dense and defect-free TiNx layers, also aligning the thermal mismatch between the active layer and the porous substrate.

Deposition of Polymers on Titanium Nitride Electrodes

“…Considering that the redox-active compound is present in the anionic form, these data indicate that the TiN surface is positively charged. This conclusion contradicts the polarity of the ζ-potential of TiN nanoparticles reported in [14,62,63], but the discrepancy can be explained by the influence of the oxide layer on the surface charge of these nanoparticles: hydrated surface oxides can be deprotonated, forming a negative surface charge. Therefore, the first polymer layer to be electrostatically deposited on the positively charged surface of the OA-treated TiN should be negatively charged, and in our case, it is PAA.…”