Surface Passivation of Silicon Nanoparticles Monitored by In Situ FTIR

Abstract

A setup consisting of two atmospheric plasma sources is used for the combined synthesis and passivation of nanoparticles. The silicon nanoparticles synthesized in the first source are analyzed for their chemical composition, morphology, and photoluminescence. The particles are then treated with a second plasma to induce surface passivation. The passivation process of the particles is monitored in real time using in situ infrared absorption spectroscopy. The results indicate that this treatment induces methylation of the silicon nanocrystals, which is further supported by XPS analysis. This surface passivation shifts the maximum of the photoluminescent signal to blue in the visible spectral region. Further optimization of the reported nanoparticle passivation process can provide a flexible tool for tuning nanoparticle properties.