A patterning method termed "RIPPLE" (reactive interface patterning promoted by lithographic electrochemistry) is applied to the fabrication of arrays of dielectric and metallic optical elements. This method uses cyclic voltammetry to impart patterns onto the working electrode of a standard three-electrode electrochemical setup. Using this technique and a template stripping process, periodic arrays of Ag circular Bragg gratings are patterned in a highthroughput fashion over large substrate areas. By varying the scan rate of the cyclically applied voltage ramps, the periodicity of the gratings can be tuned in situ over micrometer and submicrometer length scales. Characterization of the periodic arrays of periodic gratings identified point-like and annular scattering modes at different planes above the structured surface. Facile, reliable, and rapid patterning techniques like RIPPLE may enable the highthroughput and low-cost fabrication of photonic elements and metasurfaces for energy conversion and sensing applications.evelopments in photonics and plasmonics have provided a rich array of approaches for coupling and guiding light (1-5) in optoelectronic and energy applications. The structured surfaces required for photon management would ideally feature: (i) submicrometer to nanoscale feature size, (ii) precise control of feature size and periodicity over a broad range of length scales, (iii) structures that can be formed over reasonably large substrate areas, and (iv) the capacity to integrate metal and dielectric structures with various substrate geometries. To date, the fabrication of nanoscale and submicrometer structures has relied on a rich repertoire of patterning and assembly techniques (6-15). Aside from well-established techniques such as photolithography, electron-beam lithography, and focused ion beam (6), more recent patterning and assembly methods include directed and selfassembly (7-9), superlattice nanowire pattern transfer (10), dip-pen lithography (11-13), soft-lithography (14), and electrochemical lithography (15). Among these strategies there are the expected trade-offs between fidelity and resolution. In addition, patterning speed, scalability, and the cost/ease of implementation are important factors affecting the feasibility of a given method toward preparing structured surfaces for optical management.Reactive interface patterning promoted by lithographic electrochemistry (RIPPLE) is a method to form and propagate periodically spaced submicrometer structures over large areas. We demonstrate the ability of the method to pattern optical elements with facility while maintaining control over fidelity and resolution to allow for the fabrication of arrays of dielectric and metallic optical elements. Photonic elements consisting of Ag circular Bragg gratings and large-area periodic arrays of these periodically structured elements were prepared and characterized. The ability to pattern complex submicrometer structures over large areas in a facile, reliable, and timely manner has significant implicati...