Surface properties of sprayed and electrodeposited ZnO rod layers

Gromyko, Inga; Krunks, Malle; Dedova, Tatjana; Katerski, Atanas; Klauson, Deniss; Açik, Ilona Oja

doi:10.1016/j.apsusc.2017.02.065

Cited by 31 publications

(17 citation statements)

References 43 publications

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“…A similar observation that supports this hypothesis was reported for ZrO x thin films grown by dip-coating [33]; however, for ZrO x dielectric films deposited by both sputtering [34] and electrochemical methods [35], a hydrophobic property was indicated. Gromyko et al have also reported a difference in CA values for ZnO rods grown by both spray pyrolysis and electrodeposition methods [36]. et al have also reported a difference in CA values for ZnO rods grown by both spray pyrolysis and electrodeposition methods [36].…”

Section: Methodsmentioning

confidence: 99%

Influence of Post-UV/Ozone Treatment of Ultrasonic-Sprayed Zirconium Oxide Dielectric Films for a Low-Temperature Oxide Thin Film Transistor

et al. 2019

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Solution-processed metal oxides require a great deal of thermal budget in order to achieve the desired film properties. Here, we show that the deposition temperature of sprayed zirconium oxide (ZrOx) thin film can be lowered by exposing the film surface to an ultraviolet (UV) ozone treatment at room temperature. Atomic force microscopy reveals a smooth and uniform film with the root mean square roughness reduced from ~ 0.63 nm (UVO-O) to ~ 0.28 nm (UVO-120) in the UV–ozone treated ZrOx films. X-ray photoelectron spectroscopy analysis indicates the formation of a Zr–O network on the surface film, and oxygen vacancy is reduced in the ZrOx lattice by increasing the UV–ozone treatment time. The leakage current density in Al/ZrOx/p-Si structure was reduced by three orders of magnitude by increasing the UV-ozone exposure time, while the capacitance was in the range 290–266 nF/cm2, corresponding to a relative permittivity (k) in the range 5.8–6.6 at 1 kHz. An indium gallium zinc oxide (IGZO)-based thin film transistor, employing a UV-treated ZrOx gate dielectric deposited at 200 °C, exhibits negligible hysteresis, an Ion/Ioff ratio of 104, a saturation mobility of 8.4 cm2 V−1S−1, a subthreshold slope of 0.21 V.dec−1, and a Von of 0.02 V. These results demonstrate the potentiality of low-temperature sprayed amorphous ZrOx to be applied as a dielectric in flexible and low-power-consumption oxide electronics.

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Section: Methodsmentioning

confidence: 99%

Influence of Post-UV/Ozone Treatment of Ultrasonic-Sprayed Zirconium Oxide Dielectric Films for a Low-Temperature Oxide Thin Film Transistor

et al. 2019

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“…The spectra could be resolved into four peaks at BE of 285.0, 285.7, and 286.7, ±0.1, and 288.8 ± 0.3 eV. In both TiO 2 samples, the C1s peaks located at 285.0 and 285.7 ± 0.1 eV corresponded to C=C and C-C/C-H, respectively [43]. It is highly probable that hydrocarbons and other carbon-like species could be formed on the surface of TiO 2 layers as a result of preparation procedure or due to carbon contamination arising from aging of samples in ambient atmosphere [43,46].…”

Section: Xps Data Analysis Of Aged-tio 2 Thin Filmsmentioning

confidence: 92%

Section: Xps Data Analysis Of Aged-tio2 Thin Filmsmentioning

confidence: 92%

“…The peak observed in binding energy (BE) value at 530.0 ± 0.3 eV was assigned to the Ti-O bond and the peak at BE value at 530.7 ± 0.4 eV was ascribed to the presence of oxygen vacancy defects (Vo). In addition, the peak at 532.1 ± 0.1 eV was attributed to surface hydroxyl groups (OH − ), revealing that the film surface contained adsorbed surface OH − groups [43][44][45]. Figure 4c,d show the C1s core level spectra of aged-TiO 2 thin films deposited at 350 and 450 • C, respectively.…”

Section: Xps Data Analysis Of Aged-tio 2 Thin Filmsmentioning

confidence: 99%

“…It is highly probable that hydrocarbons and other carbon-like species could be formed on the surface of TiO 2 layers as a result of preparation procedure or due to carbon contamination arising from aging of samples in ambient atmosphere [43,46]. Further, there were other peaks observed at 286.7 ± 0.1, 288.8 ( Figure 4c), and 289.6 eV ( Figure 4d) that belonged to oxygen species containing carbonyl moieties, such as C-O, C=O, and O=C-O, respectively [41][42][43]47,48].Moreover, the peak positioned at 290.07 ± 0.4 eV could have resulted from the π-π shake-up process ( Figure 4c) [42].…”

Section: Xps Data Analysis Of Aged-tio 2 Thin Filmsmentioning

confidence: 99%

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Photocatalytic Degradation of Different VOCs in the Gas-Phase over TiO2 Thin Films Prepared by Ultrasonic Spray Pyrolysis

et al. 2019

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In this study, we deposited TiO2 thin films onto borosilicate glass by ultrasonic spray pyrolysis at 350 and 450 °C. The aim of study is to determine the effect of deposition temperature on photocatalytic activity of TiO2 thin films and to investigate the performance of TiO2 thin films on photocatalytic degradation of methyl tert-butyl ether (MTBE), acetone, acetaldehyde, and heptane as functions of different operating parameters. TiO2 thin films deposited at 350 and 450 °C have a thickness value of 190 and 330 nm, respectively. All as-prepared TiO2 films possess an anatase crystalline structure. According to the X-ray photon spectroscopy (XPS) study, the TiO2 thin film deposited at 350 °C showed a higher amount of oxygen vacancies and hydroxyl groups on the film surface after UV treatment. The aged-TiO2 thin film deposited at 350 °C showed a water contact angle (WCA) value of 0° after 10 min UV irradiation, showing superhydrophilic surface behavior. The TiO2 film deposited at 350 °C exhibited the highest amount of conversion of MTBE (100%). The results also showed that TiO2 films are capable of photocatalytic degradation of MTBE (100%) and acetaldehyde (approx. 80%) in humid air conditions and high airflow rate. The visible-light-activity of TiO2 thin films was tested with 5 ppm MTBE and acetone. TiO2 thin films deposited at 350 °C with a surface area of 600 cm2 showed 60% of MTBE and 33% of acetone degradation under VIS light.

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Structural and optical properties of ZnO nanorods: influence of reaction temperature

Jiang

Zheng

Lin

et al. 2017

J Mater Sci: Mater Electron

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Surface properties of sprayed and electrodeposited ZnO rod layers

Cited by 31 publications

References 43 publications

Influence of Post-UV/Ozone Treatment of Ultrasonic-Sprayed Zirconium Oxide Dielectric Films for a Low-Temperature Oxide Thin Film Transistor

Influence of Post-UV/Ozone Treatment of Ultrasonic-Sprayed Zirconium Oxide Dielectric Films for a Low-Temperature Oxide Thin Film Transistor

Photocatalytic Degradation of Different VOCs in the Gas-Phase over TiO2 Thin Films Prepared by Ultrasonic Spray Pyrolysis

Structural and optical properties of ZnO nanorods: influence of reaction temperature

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