This study aimed to evaluate the electrochemical corrosion behavior at the eutectic level of Al-Si automotive alloy in 0.2 M HCl, 0.2M NaCl, and 0.2M NaOH solutions at room temperature. By EIS method in accordance with the specific equivalent circuits of the system, and also by recording Tafel dependences, data were obtained on the kinetic and corrosion parameters in the studied environments for two types of alloys -Al-Si alloy with a eutectic composition of Si (12.7 wt. %) аnd Al-Si alloy containing traces of silicon (0.2 wt. %). Both the EIS data and the Tafel plots disclosed to addition of Si improved the corrosion resistance in the Al-Si alloy in NaCl and HCl environments. In contrast, the opposite phenomenon was observed in the NaOH environment. Added Si improved corrosion resistance by forming MgO and SiO 2 layers; nevertheless, OHmore aggressively attacks the surface than Clions, hindering the corrosion-resisting mechanism by Si. The alloys showed the best corrosion resistance in NaCl solution. In contrast, NaOH was the most destructive, followed by HCl solution, as a more compact and uniform film was formed in NaCl solution. The open circuit potential enthused to the nobler direction in eutectic alloys in NaCl and HCl solution, while NaCl showed comparatively higher open circuit potentials (OCP) than HCl and NaOH. The corrosion current from Tafel analysis and the polarization resistance from EIS analysis showed the maximum values in NaCl solution and the minimum in NaOH solution, as the corrosive attack by OHwas more damaging. The optical and SEM images revealed that scratch marks on polished surfaces were disappeared, and protective layers are formed after corrosion, which are thicker and more compact in the NaCl environment and in higher Si added alloy under NaCl and HCl solution, NaOH being an exception. These images depicted maximum damage in NaOH solution, and then in HCl solution, NaCl showed the minimum damage.