Surface ripples induced by gas cluster ion beam on copper surface at elevated temperatures

Influence of the Parameters of Cluster Ions on the Formation of Nanostructures on the KTP Surface

“…The maximum ion fluencies were 2 × 10 16 ions/cm 2 in the low-energy mode (Figure 1) and 3 × 10 15 ions/cm 2 in the high-energy mode (Figure 2). Despite the fact that the ion fluence in the high-energy mode was an order of magnitude lower, we assume that it is more correct to compare at the same etching depths because the formed nanostructures are nothing more than displaced surface material [8][9][10][11]. An aperture mask was used to estimate the etching depth and to obtain many processed areas (with different angles of incidence) on one sample.…”

“…Such structures on surfaces attract interest for wide practical use [7]. Although gas cluster ion beams (GCIB) is commonly used for highly efficient surface smoothing, it can also be used to form nanostructures [8][9][10][11][12]. It should be noted that cluster ions do less damage to the subsurface layer after processing since they have a shallower impact depth and can be lower energies per atom compared to monomer ions [9][10][11][12].…”

“…Although gas cluster ion beams (GCIB) is commonly used for highly efficient surface smoothing, it can also be used to form nanostructures [8][9][10][11][12]. It should be noted that cluster ions do less damage to the subsurface layer after processing since they have a shallower impact depth and can be lower energies per atom compared to monomer ions [9][10][11][12]. As a rule, for the formation of nanostructures, cluster beams with low energies per atom in a cluster (about several eV) are used [8][9][10][11].…”

“…It should be noted that cluster ions do less damage to the subsurface layer after processing since they have a shallower impact depth and can be lower energies per atom compared to monomer ions [9][10][11][12]. As a rule, for the formation of nanostructures, cluster beams with low energies per atom in a cluster (about several eV) are used [8][9][10][11]. This work compares the efficiency of the formation of nanostructures by gas clusters with low and high energy per atom in the cluster.…”

Наноструктурирование Поверхности Монокристалла KTP С Помощью Бомбардировки Кластерными Ионами

“…Благодаря своим особенностям, газофазные ионно-кластерные пучки эффективно применяются для высокоэффективного сглаживания поверхности, но они могут быть эффективны также для формирования периодических наноструктур при энергии, приходящейся на один атом в кластере, единицы-десятки электрон-вольт [7][8][9][10][11]. Следует отметить, что кластерные ионы меньше повреждают приповерхностный слой после обработки, так как имеют меньшую глубину воздействия и могут иметь меньшую энергию, приходящуюся на один атом, по сравнению с мономерными ионами [8][9][10][11]. В данной работе сравнивается эффективность формирования наноструктур газофазными кластерами с низкой и высокой энергией атома в кластере.…”