2017
DOI: 10.1016/j.nme.2016.09.016
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Surface roughness effects on plasma near a divertor plate and local impact angle

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Cited by 11 publications
(3 citation statements)
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“…sheath-tracing evaluated sputtering yields, or not. In literature, it was shown that micrometric roughness can have an important influence in deflecting impinging ions towards orthogonal incidence [43], which corresponds to the simulation with sheath-tracing evaluated sputtering yields. However, this seems not to be the case for the nanometric roughness of the c-W sample (see table 4), which would be commonly neglected in the evaluation of the deflection towards the surface, as occurs in the simulation without sheath-tracing.…”
Section: Discussionmentioning
confidence: 86%
“…sheath-tracing evaluated sputtering yields, or not. In literature, it was shown that micrometric roughness can have an important influence in deflecting impinging ions towards orthogonal incidence [43], which corresponds to the simulation with sheath-tracing evaluated sputtering yields. However, this seems not to be the case for the nanometric roughness of the c-W sample (see table 4), which would be commonly neglected in the evaluation of the deflection towards the surface, as occurs in the simulation without sheath-tracing.…”
Section: Discussionmentioning
confidence: 86%
“…Additionally, the results shown in this paper are important for understanding the sheath formation above nonflat or nonsmooth surfaces in laboratory plasmas, for example, rough surfaces caused by the built‐ups from the erosion and redeposition of wall materials in fusion devices (Hu et al, ) or substrate surfaces under plasma etching processes (Kawamura et al, ).…”
Section: Discussionmentioning
confidence: 88%
“…Surface roughness can lead to modification of the sheath properties, the local impact angle and thus also the average physical sputtering yields [47][48][49]. Typical arithmetic mean roughness values R a for solid PFCs exceed few micrometers [50].…”
Section: Role Of Surface Roughnessmentioning
confidence: 99%